监控VLSIC制造过程:贝叶斯方法

Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop Pub Date : 1995-11-13 DOI:10.1109/ASMC.1995.484375

Suraj Rao, Andrzej J. Strojwas, John Lehoczky, Schervish

{"title":"监控VLSIC制造过程:贝叶斯方法","authors":"Suraj Rao, Andrzej J. Strojwas, John Lehoczky, Schervish","doi":"10.1109/ASMC.1995.484375","DOIUrl":null,"url":null,"abstract":"We have developed a process monitoring system, in a Bayesian framework, which is designed to be used for monitoring VLSIC and other multi-stage manufacturing processes. For a single step process, the Bayesian monitor is at least as good as the Shewhart-CUSUM combination charts for detecting changes in the distribution of the in-lines collected from the step. For a multi-stage process, however, the Bayesian monitor can significantly reduce the detection time by using in-line correlation information from earlier stages.","PeriodicalId":237741,"journal":{"name":"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop","volume":"112 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-11-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Monitoring VLSIC fabrication processes: a Bayesian approach\",\"authors\":\"Suraj Rao, Andrzej J. Strojwas, John Lehoczky, Schervish\",\"doi\":\"10.1109/ASMC.1995.484375\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We have developed a process monitoring system, in a Bayesian framework, which is designed to be used for monitoring VLSIC and other multi-stage manufacturing processes. For a single step process, the Bayesian monitor is at least as good as the Shewhart-CUSUM combination charts for detecting changes in the distribution of the in-lines collected from the step. For a multi-stage process, however, the Bayesian monitor can significantly reduce the detection time by using in-line correlation information from earlier stages.\",\"PeriodicalId\":237741,\"journal\":{\"name\":\"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop\",\"volume\":\"112 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-11-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.1995.484375\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1995.484375","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 1

摘要

我们在贝叶斯框架中开发了一个过程监控系统，该系统旨在用于监控VLSIC和其他多阶段制造过程。对于单步流程，在检测从该步骤收集的内联分布的变化方面，贝叶斯监视器至少与shehart - cusum组合图一样好。然而，对于一个多阶段的过程，贝叶斯监测器可以通过使用来自早期阶段的在线相关信息来显着减少检测时间。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Monitoring VLSIC fabrication processes: a Bayesian approach

We have developed a process monitoring system, in a Bayesian framework, which is designed to be used for monitoring VLSIC and other multi-stage manufacturing processes. For a single step process, the Bayesian monitor is at least as good as the Shewhart-CUSUM combination charts for detecting changes in the distribution of the in-lines collected from the step. For a multi-stage process, however, the Bayesian monitor can significantly reduce the detection time by using in-line correlation information from earlier stages.

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Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop

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