{"title":"传统和分级沟道全耗尽绝缘体上硅nmosfet的浮体效应比较","authors":"M. Pavanello, J. Martino, D. Flandre","doi":"10.1109/ICCDCS.2000.869840","DOIUrl":null,"url":null,"abstract":"In this work the parasitic bipolar effects are studied and compared in conventional and graded-channel fully-depleted SOI nMOSFETs by means of both two-dimensional simulation and experiments. The multiplication factor and parasitic bipolar gain, which are the parameters responsible for the parasitic BJT action, are investigated separately. Breakdown voltage, abnormal subthreshold slope and hysteresis are also investigated. The graded-channel device efficiently alleviates the parasitic BST activation, improving the breakdown voltage.","PeriodicalId":301003,"journal":{"name":"Proceedings of the 2000 Third IEEE International Caracas Conference on Devices, Circuits and Systems (Cat. No.00TH8474)","volume":"19 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-03-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Comparison of floating-body effects in conventional and graded-channel fully-depleted silicon-on-insulator nMOSFETs\",\"authors\":\"M. Pavanello, J. Martino, D. Flandre\",\"doi\":\"10.1109/ICCDCS.2000.869840\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work the parasitic bipolar effects are studied and compared in conventional and graded-channel fully-depleted SOI nMOSFETs by means of both two-dimensional simulation and experiments. The multiplication factor and parasitic bipolar gain, which are the parameters responsible for the parasitic BJT action, are investigated separately. Breakdown voltage, abnormal subthreshold slope and hysteresis are also investigated. The graded-channel device efficiently alleviates the parasitic BST activation, improving the breakdown voltage.\",\"PeriodicalId\":301003,\"journal\":{\"name\":\"Proceedings of the 2000 Third IEEE International Caracas Conference on Devices, Circuits and Systems (Cat. No.00TH8474)\",\"volume\":\"19 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-03-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the 2000 Third IEEE International Caracas Conference on Devices, Circuits and Systems (Cat. No.00TH8474)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICCDCS.2000.869840\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 2000 Third IEEE International Caracas Conference on Devices, Circuits and Systems (Cat. No.00TH8474)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICCDCS.2000.869840","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Comparison of floating-body effects in conventional and graded-channel fully-depleted silicon-on-insulator nMOSFETs
In this work the parasitic bipolar effects are studied and compared in conventional and graded-channel fully-depleted SOI nMOSFETs by means of both two-dimensional simulation and experiments. The multiplication factor and parasitic bipolar gain, which are the parameters responsible for the parasitic BJT action, are investigated separately. Breakdown voltage, abnormal subthreshold slope and hysteresis are also investigated. The graded-channel device efficiently alleviates the parasitic BST activation, improving the breakdown voltage.