p型6H-SiC体晶电学性能研究

Xuejian Xie, Yan Peng, Longfei Xiao, Xiaobo Hu, Xiangang Xu
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引用次数: 0

摘要

采用物理气相输运(PVT)法制备不同铝掺杂浓度的6H-SiC单晶。在生长过程中使用Al2O3粉末作为铝源,并将其放入小型坩埚中,以避免铝源的快速耗尽。利用二次离子质谱(SIMS)和Van-der-Pauw结构的霍尔测量分别表征了Al原子的掺入和p型6H-SiC的电学性质。结果表明:4×1018 cm-3铝浓度中的最大空穴浓度为1.3×1017 cm-3,霍尔迁移率为24.8 cm2/V·S,电阻率为1.89 Ω·cm;采用非接触电阻率测试系统和创新的非接触电阻率测量系统对样品在室温下的电阻率进行了详细的研究。结果表明,当铝含量为4×1018 cm-3时,晶圆中心区域的电阻率最小值为855 mΩ·cm;此外,还讨论了沿生长方向和径向的电阻率分布。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigation of electrical properties of P-type 6H-SiC bulk crystal
6H-SiC single crystals with different aluminum doping concentrations were grown by physical vapor transport (PVT) method. Al2O3 powder was used as Al source during the growth and was put into a small crucible to avoid the rapid depletion of aluminum source. The incorporation of Al atoms and electrical properties of p-type 6H-SiC were characterized by secondary ion mass spectroscopy (SIMS) and Hall measurements in Van-der-Pauw configuration, respectively. Results showed that the maximum hole concentration in aluminum concentration of 4×1018 cm-3 was 1.3×1017 cm-3 with Hall mobility of 24.8 cm2/V·S and resistivity of 1.89 Ω·cm. The resistivities of samples were investigated in detail by a noncontact resistivity testing system and an innovative contactless resistivity measurement system at room temperature. Results showed that the minimum resistivity of 855 mΩ·cm was obtained at the center region of one wafer with the aluminum content of 4×1018 cm-3. In addition, the resistivity distributions along the growth direction and the radial direction were discussed.
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