半导体晶体中协同作用点缺陷的电子态跃迁

M. A. Mohamed, B. Majlis, M. Ani
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引用次数: 0

摘要

研究了半导体晶体中深能级点缺陷的电子态跃迁。低温生长的砷化镓在掺杂Be后产生过量的反位砷(AsGa),产生局域自旋。在4 K左右的温度下,电阻几乎突然下降了1.7%,这与磁化强度的突然下降是一致的。这些观察结果被解释为AsGa缺陷电子态协同跃迁的结果。对具有浅层Be受体的AsGa原子的电子态的第一次主计算表明,在跃迁时,AsGa+离子被转移到间隙位置,成为中性原子,最终形成空穴,从而提高电导率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electronic state transition in cooperatively interacting point-defects in semiconductor crystals
Electron state transition of deep level point defects in a semiconductor crystal was studied. Low-temperature grown GaAs produced excess antisite As (AsGa) which produces localized spin when doped with Be. A nearly abrupt decrease of 1.7% of the resistance is detected at a temperature around 4 K which is consistent with abrupt decrease of magnetization. These observations are explained as a result of cooperative transition of electron states of AsGa defects. First-principal calculations of the electron state of an AsGa atom with a shallow acceptor Be show that at the transition an AsGa+ ion is displaced to the interstitial site and becomes a neutral atom and finally results in formation of a hole producing enhancement in conductivity.
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