铜基石墨烯纳米板复合材料在电力电子封装中的互连研究

Jing Wang, Zhaoxia Zhou, Wen-Feng Lin, Changqing Liu, B. Ahmadi, L. Empringham
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引用次数: 0

摘要

本研究展示了一种单步电沉积方法,用于制备致密的铜基石墨烯纳米片(GnPs)纳米复合涂层,并与分散的GnP共沉积。研究了阴极电流密度对镀层表面形貌的影响。随着沉积电流密度从10 mA/cm2增加到40 mA/cm2,共沉积GnPs的横向尺寸逐渐增大,分布密度逐渐减小,沉积物表面特征逐渐减小。利用XPS结合Ar离子溅射对复合涂层亚表面区域的GnP进行了化学状态评估,发现其与原始GnPs相当。与未处理Cu和纯Cu镀层相比,Cu- gnp复合镀层的电阻略高。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Copper-based Graphene Nanoplatelet Composites as Interconnect for Power Electronics Pacakging
The present investigation demonstrates a singlestep electrodeposition route for the fabrication of compact copper-based graphene nanoplatelets (GnPs) nanocomposite coatings, with dispersed GnP co-deposition. The effect of cathodic current density on the surface morphology of the deposits was examined. With increasing deposition current densities from 10 to 40 mA/cm2, there seemed to be a gradual increase in the lateral size of co-deposited GnPs and a decrease in their distribution density, along with a progressive decrease in the deposit surface feature. The chemical state of GnP from the sub-surface region of composite coatings was assessed using XPS in conjunction with Ar ion sputtering and found comparable to that of pristine GnPs. The Cu-GnP composite coatings exhibited slightly higher electrical sheet resistance, compared to that of the untreated Cu and pure Cu deposited counterparts.
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