{"title":"基于模拟退火的版图良率提高","authors":"R. Karri, A. Orailoglu","doi":"10.1109/GLSV.1994.289975","DOIUrl":null,"url":null,"abstract":"This paper presents DEFT, a system for synthesizing defect-tolerant layouts, that in-grains tolerance to fabrication induced defects. This is accomplished by dispersing nets with large overlaps into nonadjacent tracks. DEFT also affords trade-offs between area (measured as the number of tracks) and yield of the resulting layout. The defect-tolerant layouts synthesized by DEFT have been consistently superior to those generated by other layout synthesis systems.<<ETX>>","PeriodicalId":330584,"journal":{"name":"Proceedings of 4th Great Lakes Symposium on VLSI","volume":"133 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1994-03-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Simulated annealing based yield enhancement of layouts\",\"authors\":\"R. Karri, A. Orailoglu\",\"doi\":\"10.1109/GLSV.1994.289975\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents DEFT, a system for synthesizing defect-tolerant layouts, that in-grains tolerance to fabrication induced defects. This is accomplished by dispersing nets with large overlaps into nonadjacent tracks. DEFT also affords trade-offs between area (measured as the number of tracks) and yield of the resulting layout. The defect-tolerant layouts synthesized by DEFT have been consistently superior to those generated by other layout synthesis systems.<<ETX>>\",\"PeriodicalId\":330584,\"journal\":{\"name\":\"Proceedings of 4th Great Lakes Symposium on VLSI\",\"volume\":\"133 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1994-03-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of 4th Great Lakes Symposium on VLSI\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/GLSV.1994.289975\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 4th Great Lakes Symposium on VLSI","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/GLSV.1994.289975","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Simulated annealing based yield enhancement of layouts
This paper presents DEFT, a system for synthesizing defect-tolerant layouts, that in-grains tolerance to fabrication induced defects. This is accomplished by dispersing nets with large overlaps into nonadjacent tracks. DEFT also affords trade-offs between area (measured as the number of tracks) and yield of the resulting layout. The defect-tolerant layouts synthesized by DEFT have been consistently superior to those generated by other layout synthesis systems.<>