用太赫兹辐射脉冲表征半导体材料

A. Krotkus, R. Adomavičius, V. Pačebutas
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摘要

综述了利用频率范围在几百GHz到几太赫兹之间的电磁辐射脉冲的实验技术及其在各种半导体材料表征中的应用。通过使用脉冲太赫兹技术可以确定的材料参数列表包括载流子寿命,它们的能量和动量弛豫时间,导带的谷间分离以及材料的非线性光学敏感性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Characterizing semiconductor materials with terahertz radiation pulses
Experimental techniques that exploit pulses of the electromagnetic radiation with characteristic spectra covering the frequency range between few hundreds GHz and few THz and their applications in the characterization of various semiconductor materials are reviewed. The list of material parameters that can be determined by using pulsed THz techniques includes, among other, carrier lifetimes, their energy and momentum relaxation times, inter-valley separation in the conduction band, and nonlinear optical susceptibilities of the material.
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