{"title":"VDDmin跨Fab过程建模中的蒙特卡罗仿真","authors":"Huiping Guo, Yang Yang, Jiang Bowen","doi":"10.1109/ACQED.2012.6320499","DOIUrl":null,"url":null,"abstract":"VDDmin is defined as the lowest supply voltage at which a device can produce correct logic states. It is typically obtained by performing a binary or linear supply voltage search. VDDmin or very-low voltage (VLV) testing is a non-IDDQ defect based test method that has been shown to be an effective method to screen manufacturing defects [1, 2, 3, 4]. It is taken as an indicator of device performance and reliability. Monte Carlo simulation is a random sampling based computational methodology, used extensively for engineering analysis [5, 6, 7]. This paper discuss a VDDmin determination methodology base on-Monte Carlo simulation, case study is presented to illustrate that this approach can precisely predict yield impact due to process shift.","PeriodicalId":161858,"journal":{"name":"2012 4th Asia Symposium on Quality Electronic Design (ASQED)","volume":"177 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Monte Carlo simulation in VDDmin modeling across Fab process\",\"authors\":\"Huiping Guo, Yang Yang, Jiang Bowen\",\"doi\":\"10.1109/ACQED.2012.6320499\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"VDDmin is defined as the lowest supply voltage at which a device can produce correct logic states. It is typically obtained by performing a binary or linear supply voltage search. VDDmin or very-low voltage (VLV) testing is a non-IDDQ defect based test method that has been shown to be an effective method to screen manufacturing defects [1, 2, 3, 4]. It is taken as an indicator of device performance and reliability. Monte Carlo simulation is a random sampling based computational methodology, used extensively for engineering analysis [5, 6, 7]. This paper discuss a VDDmin determination methodology base on-Monte Carlo simulation, case study is presented to illustrate that this approach can precisely predict yield impact due to process shift.\",\"PeriodicalId\":161858,\"journal\":{\"name\":\"2012 4th Asia Symposium on Quality Electronic Design (ASQED)\",\"volume\":\"177 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-07-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2012 4th Asia Symposium on Quality Electronic Design (ASQED)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ACQED.2012.6320499\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 4th Asia Symposium on Quality Electronic Design (ASQED)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ACQED.2012.6320499","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Monte Carlo simulation in VDDmin modeling across Fab process
VDDmin is defined as the lowest supply voltage at which a device can produce correct logic states. It is typically obtained by performing a binary or linear supply voltage search. VDDmin or very-low voltage (VLV) testing is a non-IDDQ defect based test method that has been shown to be an effective method to screen manufacturing defects [1, 2, 3, 4]. It is taken as an indicator of device performance and reliability. Monte Carlo simulation is a random sampling based computational methodology, used extensively for engineering analysis [5, 6, 7]. This paper discuss a VDDmin determination methodology base on-Monte Carlo simulation, case study is presented to illustrate that this approach can precisely predict yield impact due to process shift.