六氟化硫气氛中硅的激光微加工:实验与数值模拟

CLEO/Europe. 2005 Conference on Lasers and Electro-Optics Europe, 2005. Pub Date : 2005-06-17 DOI:10.1109/CLEOE.2005.1568441

Y.M. Yashkir, S. Lee, M. Harb, Y.Yu. Yashkir

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引用次数: 1

摘要

报道了用连续波激光器和不同气体环境对硅进行微加工的条件。本文报道了连续波532 nm激光在六氟化硫大气中对硅的蚀刻速率的实验研究结果，并对该过程进行了三维时间计算机模拟

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Laser micromachining of silicon in sulfur hexafluoride atmosphere: experiment and numerical simulation

Micromachining conditions for silicon using a CW lasers and different gas ambients were reported. We report results of experimental investigation of the etch rate of silicon using a CW 532 nm laser in sulfur hexafluoride atmosphere, and three-dimensional temporal computer modeling of the process

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来源期刊

CLEO/Europe. 2005 Conference on Lasers and Electro-Optics Europe, 2005.

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