宽禁带材料的激光微加工

I. Salama, N. Quick, A. Kar
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引用次数: 1

摘要

采用激光直写掺杂技术(LDWD)研究了碳化硅和金刚石等宽禁带材料电性能的变化。利用该方法在不同的金刚石和SiC衬底上创建导电、p型掺杂、n型掺杂和绝缘磁道。研究了激光与物质相互作用时间、重复曝光次数和辐照环境类型等工艺参数对激光与物质相互作用的影响。利用SEM、SIMS、XPS和拉曼光谱分别研究了激光辐照对基体微观结构、化学结合的影响,并获得了掺杂物在基体中的深度分布。LDWD技术被证明可以提高掺杂剂(氮)向SiC的扩散率,导致扩散系数(可在论文中获得)比报道值(5 x 10-12 cm2s-1)快4个数量级。为了研究激光掺杂过程的原子性,利用激光辐照提高掺杂剂的渗透和浓度,进行了过程建模。激光掺杂氮改变了4H-SiC的拉曼光谱,表明拉曼光谱可以作为一种非接触的方法来表征激光掺杂SiC。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Laser microprocessing of wide bandgap materials
Laser direct-write and doping technique (LDWD) is used to introduce variations in electric properties of wide band gap materials such as SiC and diamond. Conductive, p-type doped, n-type doped and insulative tracks are created on different diamond and SiC substrates using this method. The effects of various processing parameters such as laser-matter interaction time, number of repeated exposures, and type of irradiation environment are investigated. SEM, SIMS, XPS and Raman spectroscopy are used to study the effect of laser irradiation on the microstructure, chemical binding and to obtain dopant depth profile in the substrates, respectively. LDWD technique proved to enhance the dopant (nitrogen) diffusivity into SiC resulted in a diffusion coefficient (available in paper)that is four orders of magnitudes faster than the reported value (5 x 10-12 cm2s-1). Process modeling is conducted to study the atomistic of laser-doping process and to utilize laser irradiation to increase both dopant penetration and concentration. Laser doping of nitrogen alters the Raman spectrum of the 4H-SiC suggesting that Raman spectroscopy can be used as a non-contact method to characterize the laser-doped SiC.
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