InGaAsSb封盖层对InAs/InGaAsSb量子点结构性能的影响

Yeongho Kim, N. Faleev, C. Honsberg
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引用次数: 0

摘要

用x射线衍射研究了in含量为3,7,9 %的InGaAsSb层中嵌入的InAs量子点的结构性质。In的掺入增加了InGaAsSb在结构中的面内和面外应变。当掺量为3%时,晶体缺陷密度增大。然而,当In含量进一步增加到7%和9%时,由于InAs量子点与InGaAsSb层之间的晶格不匹配减少,导致缺陷密度降低。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of InGaAsSb capping layer on the structural properties of InAs/InGaAsSb quantum dots
The structural properties of the InAs QDs embedded in the InGaAsSb layers with varying In content of 3, 7, and 9 % have been investigated by x-ray diffraction. The In incorporation increases the in-plane and out-of-plane strain of the InGaAsSb in the structures. The density of crystalline defects is increased when the In content of 3 % is incorporated. However, the further increase of In content to 7 and 9 % leads to the decrease of the defect density as a result of the reduced lattice mismatch between the InAs QDs and InGaAsSb layers.
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