计算简单和复杂半导体能带结构的基于物理的经验赝势模型

G. Pennington, N. Goldsman, J.M. McGarrity, F. Crowne
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引用次数: 1

摘要

为了充分模拟半导体器件,通常需要全带结构。它对在高功率和高磁场下工作的器件非常重要,并决定了许多材料的性能。经验赝势法(EPM)计算简便、精度高,是全区模拟的首选能带结构方法。虽然EPM对大多数金刚石和锌闪锌矿半导体工作得很好,但对于更复杂的结构和更大的单元电池来说,它就不那么有效了。对于这些材料,必须拟合更多的EPM参数,而通常可用的实验数据较少。通过对Heine和Animalu (Phil)的非局域原子模型电位的适应。第12卷,第1249-1269页,1965年),我们开发了一个模型经验伪势,通过大幅减少所需的拟合参数,可以将EPM的使用扩展到具有大单元电池的半导体。该方法有效地应用于Si、C、3C-SiC、4H-SiC和6H-SiC的能带结构计算。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A physics-based empirical pseudopotential model for calculating band structures of simple and complex semiconductors
The full zone band structure is often needed for adequate simulation of semiconductor devices. It is important for devices operating under high power and high fields and determines many material properties. The computational ease and good accuracy of the empirical pseudopotential method (EPM) make it the band structure method of choice for full-zone simulations. While the EPM works well for most diamond and zincblende semiconductors, it becomes less effective for more complicated structures with larger unit cells. For these materials, more EPM parameters must be fitted while less experimental data is usually available. Through the adaption of the nonlocal atomic model potential of Heine and Animalu (Phil. Mag. vol. 12, pp. 1249-1269, 1965), we have developed a model empirical pseudopotential which, by drastically reducing the fitting parameters needed, can extend the use of the EPM to semiconductors with large unit cells. The method is effectively applied to the band structure calculations of Si, C, 3C-SiC, 4H-SiC, and 6H-SiC here.
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