低压MOCVD生长的电压和电流源偏置光电晶体管的表面效应

H.R. Chen, S. Tan, A. Lin, W.T. Chen, W. Lour
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引用次数: 0

摘要

我们报道了低压MOCVD生长的InGaP/GaAs异质结光电晶体管(HPT),基面有钝化和没有钝化。典型结构包括0.5-/spl μ m n/sup +/- gaas子收集器(n/sup +/=5/spl倍/10/sup 18/cm/sup -3/)、0.6-/spl μ m n/sup -/- gaas收集器(n/sup -/=5/spl倍/10/sup 16-3/)、0.14-/spl μ m p/sup +/- gaas基(p/sup +/=4/spl倍/10/sup 19/cm/sup -3/)、0.07-/spl μ /m n- ingap发射极(n=5/spl倍/10/sup 17/cm/sup -3/)和0.3-/spl μ /m n/sup +/- gaas帽层(n/sup +/=5/spl倍/10/sup 18/cm/sup -3/)。制备的hpt和hpt的发射极面积均为150/spl倍/150 /spl μ /m/sup 2/,吸收面积为4/spl倍/ 10cm。光学/电学实验和测量包括基面对光学响应率的影响,电压源和电流源偏置基对hpt性能的影响。以下是我们的重要结果和结论。1. 基面效应:(1)宽间隙InGaP作为基面钝化层对850 nm入射光是透明的;(2)这种钝化基面具有更高的响应率。钝化(非钝化)器件的测量响应度为0.64/spl plusmn/0.01 (0.57/spl plusmn/0.01) A/W。2. 电压源偏置HPT:(1)两种HPT在小电压水平下集电极和反向基极电流均在其p-i-n光电流处饱和;(2)如果B-E结由于电压小而断导,基极集电极区产生的光电流不会放大;(3)即使施加电压将HBT推至高电流增益水平,其光电流放大幅度也仅为3,远小于浮基HPT。3.电流源偏置HPT:两种HPT的集电极光电流和光增益都随着输入电流的增加而增加。测量的集电极光电流等于其光电流的-32倍和-48倍。因此,我们得出结论,使用电流源将hbt工作点推至高电流水平能够提高光学性能。随着输入电流的增加,钝化hpt的增强趋势更为明显,表明钝化hpt更适合目前在集成光电电路中的应用。此外,本文还介绍了采用扩展Ebers-Moll配置的电压源和电流源偏置hpt电路模型及其计算结果。计算结果与实验数据吻合较好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Surface effects on voltage- and current-source bias phototransistors grown by low-pressure MOCVD
We report on low-pressure MOCVD grown InGaP/GaAs heterojunction phototransistors (HPT) with and without passivated base surface. The typical structure consists of a 0.5-/spl mu/m n/sup +/-GaAs sub-collector (n/sup +/=5/spl times/10/sup 18/cm/sup -3/), a 0.6-/spl mu/m n/sup -/-GaAs collector (n/sup -/=5/spl times/10/sup 16-3/), a 0.14-/spl mu/m p/sup +/-GaAs base (p/sup +/=4/spl times/10/sup 19/cm/sup -3/), a 0.07-/spl mu/m n-InGaP emitter (n=5/spl times/10/sup 17/cm/sup -3/), and a 0.3-/spl mu/m n/sup +/-GaAs cap layer (n/sup +/=5/spl times/10/sup 18/cm/sup -3/). Both fabricated HBTs and HPTs have their emitter areas of 150/spl times/150 /spl mu/m/sup 2/ with an absorption area of 4/spl times/10 cm. Optical/electrical experiments and measurements include effects of base surface on optical responsivity, performances of HPTs with a voltage-source and current-source bias base. Following are our important results and conclusions. 1. Effects of base surface: (1) wide-gap InGaP as a base surface passivation layer is transparent to 850-nm incident light, (2) a higher responsivity is available for such a passivated base layer. The measured responsivity is 0.64/spl plusmn/0.01 (0.57/spl plusmn/0.01) A/W for passivated (nonpassivated) devices. 2. Voltage-source bias HPT: (1) both collector and reverse base currents saturate at their p-i-n photocurrents for both kinds of HPTs at a small voltage level; (2) there is no amplification of photocurrent generated with base-collector region if B-E junction is off conductive due to small voltage; (3) even if the applied voltage pushes a HBT to the high current gain level, the magnitude of amplification of photocurrent is only 3, which is much smaller than that from a HPT with a floating base. 3. Current-source bias HPT: both collector photocurrent and optical gain are increased with increasing input current for both kinds of HPTs. The measured collector photocurrents equal -32 and -48 times of their photocurrent. So, we conclude that pushing HBTs operating point to a high current level using a current source is able to enhance optical performances. The enhanced trend with input current is more obvious, indicating that passivated HPTs are more suitable for present applications in integrated optoelectronic circuits. Furthermore, a voltage-source and a current-source bias HPT-circuit model using extended Ebers-Moll configuration and related results calculated therein are presented in this work. It is found that calculated results are in good agreement with experimental data.
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