脉冲开关条件下p-GaN栅极hemt的栅极击穿和电致发光增强

Huan Wang, Yulian Yin, Fengwei Ji, Jiahong Du, Haoran Li, Changhui Zhao, Baikui Li, Cungang Hu, Wenping Cao, Xi Tang, Shu-Ting Yang
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摘要

在这项工作中,在肖特基型p-GaN栅极hemt中观察和研究了脉冲开关条件下增强的栅极击穿。脉冲时间相关击穿(TDB)和脉冲门击穿特性都具有正的频率相关性。当栅极偏置为10 V时,有效总寿命从170 s延长到670 s,开关频率从5 Hz增加到10 kHz。通过对具有半透明栅电极的器件的时间相关电致发光(TDEL)特性分析,在更高的开关频率下,高能紫外发射增加,表明p-GaN/AlGaN/GaN异质结构的空穴注入增强。增强的空穴注入湮灭了更多的注入电子,从而抑制了热电子效应,增强了栅极击穿。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Enhanced gate breakdown and electroluminescence in p-GaN gate HEMTs under pulsed switching conditions
In this work, enhanced gate breakdown under pulsed switching conditions were observed and investigated in Schottky-type p-GaN gate HEMTs. The pulsed time-dependent breakdown (TDB) and pulsed gate breakdown characteristics both featured a positive frequency dependence. At a gate bias of 10 V, the effective total lifetime extended from 170 s to 670 s with the switching frequency increased from 5 Hz to 10 kHz. By time-dependent electroluminescence (TDEL) characteristics on devices with semi-transparent gate electrodes, the high-energy ultraviolet emission increased at a higher switching frequency, indicating an enhanced hole injection into the p-GaN/AlGaN/GaN heterostructure. The enhanced hole injection annihilated more injected electrons, leading to the suppressed hot-electron effect, as well as the enhanced gate breakdown.
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