{"title":"Langmuir-Blodgett技术制备的CdS纳米晶体在SiO2表面的自组装","authors":"K. Svit, K. Zhuravlev","doi":"10.1109/EDM.2015.7184490","DOIUrl":null,"url":null,"abstract":"Self-assembly of CdS nanocrystals during evaporation of Langmuir-Blodgett matrix on the silica surface was investigated. Information about the size and spatial distribution of self-assembled nanocrystal ensembles were obtained using atomic force microscopy. It was found that matrix annealing temperature strongly affect self-assembly pattern. At annealing temperatures within the range of 175-200°C self-assembly mainly determined by vad der Waals forces between the nanocrystals resulting in formation of three-dimensional ensembles. With annealing temperature increase NC tend to spread evenly on the substrate surface create due to increase on capillary forces influence on self-assembly process.","PeriodicalId":213801,"journal":{"name":"2015 16th International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices","volume":"58 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-08-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Self-assembly of CdS nanocrystals obtained by Langmuir-Blodgett technique on the SiO2 surface\",\"authors\":\"K. Svit, K. Zhuravlev\",\"doi\":\"10.1109/EDM.2015.7184490\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Self-assembly of CdS nanocrystals during evaporation of Langmuir-Blodgett matrix on the silica surface was investigated. Information about the size and spatial distribution of self-assembled nanocrystal ensembles were obtained using atomic force microscopy. It was found that matrix annealing temperature strongly affect self-assembly pattern. At annealing temperatures within the range of 175-200°C self-assembly mainly determined by vad der Waals forces between the nanocrystals resulting in formation of three-dimensional ensembles. With annealing temperature increase NC tend to spread evenly on the substrate surface create due to increase on capillary forces influence on self-assembly process.\",\"PeriodicalId\":213801,\"journal\":{\"name\":\"2015 16th International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices\",\"volume\":\"58 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-08-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2015 16th International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EDM.2015.7184490\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 16th International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EDM.2015.7184490","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
摘要
研究了CdS纳米晶体在Langmuir-Blodgett矩阵蒸发过程中在二氧化硅表面的自组装。利用原子力显微镜获得了自组装纳米晶系的尺寸和空间分布信息。发现基体退火温度对自组装模式有较大影响。在175-200℃的退火温度范围内,自组装主要由纳米晶体之间的vad - der - Waals力决定,从而形成三维系综。随着退火温度的升高,由于毛细力的增加对自组装过程的影响,cnc在基体表面的分布趋于均匀。
Self-assembly of CdS nanocrystals obtained by Langmuir-Blodgett technique on the SiO2 surface
Self-assembly of CdS nanocrystals during evaporation of Langmuir-Blodgett matrix on the silica surface was investigated. Information about the size and spatial distribution of self-assembled nanocrystal ensembles were obtained using atomic force microscopy. It was found that matrix annealing temperature strongly affect self-assembly pattern. At annealing temperatures within the range of 175-200°C self-assembly mainly determined by vad der Waals forces between the nanocrystals resulting in formation of three-dimensional ensembles. With annealing temperature increase NC tend to spread evenly on the substrate surface create due to increase on capillary forces influence on self-assembly process.