{"title":"用于ku波段应用的低驱动电压电容式RF MEMS开关","authors":"A. Mahesh","doi":"10.1109/I2CT.2014.7092073","DOIUrl":null,"url":null,"abstract":"This paper presents a unique model of shunt capacitive Microelectromechanical switch which works at RF frequency (12-18 GHz) with low insertion loss and high isolation. Low actuation voltage, removal of stiction and making a switch to work at Ku band frequency are main goals of this design. The ribs that are used in this model are made very stiff to avoid stiction problem. Hafnium Dioxide (HfO2) has been used as dielectric material with high dielectric constant (k~25) leading to high isolation. The designed switch is optimized to work at a very low actuation voltage (~11.32 Volt) with high isolation, -20 dB and low insertion loss, -0.095 dB.","PeriodicalId":384966,"journal":{"name":"International Conference for Convergence for Technology-2014","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-04-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"Low actuation voltage capacitive RF MEMS switch for Ku-band applications\",\"authors\":\"A. Mahesh\",\"doi\":\"10.1109/I2CT.2014.7092073\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents a unique model of shunt capacitive Microelectromechanical switch which works at RF frequency (12-18 GHz) with low insertion loss and high isolation. Low actuation voltage, removal of stiction and making a switch to work at Ku band frequency are main goals of this design. The ribs that are used in this model are made very stiff to avoid stiction problem. Hafnium Dioxide (HfO2) has been used as dielectric material with high dielectric constant (k~25) leading to high isolation. The designed switch is optimized to work at a very low actuation voltage (~11.32 Volt) with high isolation, -20 dB and low insertion loss, -0.095 dB.\",\"PeriodicalId\":384966,\"journal\":{\"name\":\"International Conference for Convergence for Technology-2014\",\"volume\":\"7 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-04-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Conference for Convergence for Technology-2014\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/I2CT.2014.7092073\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference for Convergence for Technology-2014","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/I2CT.2014.7092073","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Low actuation voltage capacitive RF MEMS switch for Ku-band applications
This paper presents a unique model of shunt capacitive Microelectromechanical switch which works at RF frequency (12-18 GHz) with low insertion loss and high isolation. Low actuation voltage, removal of stiction and making a switch to work at Ku band frequency are main goals of this design. The ribs that are used in this model are made very stiff to avoid stiction problem. Hafnium Dioxide (HfO2) has been used as dielectric material with high dielectric constant (k~25) leading to high isolation. The designed switch is optimized to work at a very low actuation voltage (~11.32 Volt) with high isolation, -20 dB and low insertion loss, -0.095 dB.
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