{"title":"高频无线应用中SiGe HBT LNAs的大信号鲁棒性","authors":"T. Thrivikraman, A. Madan, J. Cressler","doi":"10.1109/SMIC.2010.5422968","DOIUrl":null,"url":null,"abstract":"We present measured results and analysis from high-power testing of three different X-band SiGe HBT LNAs. The custom measurement setup allowed high RF power (up to 32 dBm) to be applied to the input of the LNAs for 400 sec. During the stressing, the bias current was monitored and the pre/post-stress dc and ac characteristics were measured. The results indicate that, in the three LNAs tested, catastrophic failures can occur at these high powers, while at lower input power (less than 30 dBm), the LNA gain is degraded. Analysis shows that during the stressing, the collector current density inside the transistors increases enough to damage the device, in a manner similar to that experienced during mixed-mode reliability stress.","PeriodicalId":404957,"journal":{"name":"2010 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems (SiRF)","volume":"16 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-01-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"14","resultStr":"{\"title\":\"On the large-signal robustness of SiGe HBT LNAs for high-frequency wireless applications\",\"authors\":\"T. Thrivikraman, A. Madan, J. Cressler\",\"doi\":\"10.1109/SMIC.2010.5422968\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present measured results and analysis from high-power testing of three different X-band SiGe HBT LNAs. The custom measurement setup allowed high RF power (up to 32 dBm) to be applied to the input of the LNAs for 400 sec. During the stressing, the bias current was monitored and the pre/post-stress dc and ac characteristics were measured. The results indicate that, in the three LNAs tested, catastrophic failures can occur at these high powers, while at lower input power (less than 30 dBm), the LNA gain is degraded. Analysis shows that during the stressing, the collector current density inside the transistors increases enough to damage the device, in a manner similar to that experienced during mixed-mode reliability stress.\",\"PeriodicalId\":404957,\"journal\":{\"name\":\"2010 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems (SiRF)\",\"volume\":\"16 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-01-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"14\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems (SiRF)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMIC.2010.5422968\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems (SiRF)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMIC.2010.5422968","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
On the large-signal robustness of SiGe HBT LNAs for high-frequency wireless applications
We present measured results and analysis from high-power testing of three different X-band SiGe HBT LNAs. The custom measurement setup allowed high RF power (up to 32 dBm) to be applied to the input of the LNAs for 400 sec. During the stressing, the bias current was monitored and the pre/post-stress dc and ac characteristics were measured. The results indicate that, in the three LNAs tested, catastrophic failures can occur at these high powers, while at lower input power (less than 30 dBm), the LNA gain is degraded. Analysis shows that during the stressing, the collector current density inside the transistors increases enough to damage the device, in a manner similar to that experienced during mixed-mode reliability stress.