ZnO:Zr薄膜非线性光学特性及表面粗糙度研究

K. Bahedi, M. Addou, M. El Jouad, Z. Sofiani, S. Bayoud, B. Sahraoui, Z. Essaidi
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引用次数: 3

摘要

以氯化锌和氯化锆为前驱体,采用反应化学粉碎喷雾热解技术,在450℃加热的玻璃衬底上制备了氧化锌(ZnO)和掺锆氧化锌(ZnO:Zr)薄膜。利用原子力显微镜(AFM)和三次谐波发生(THG)研究了锆掺杂剂和表面粗糙度对非线性光学性能的影响。磁化率chi(3)在粗糙度较小的掺杂薄膜中得到最佳值。在450℃时,掺5%的样品具有较强的三阶非线性光学磁化率chi(3) = 20,49乘以10-12 (esu)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Study of nonlinear-optical properties and roughness surface of ZnO:Zr thin films
Zinc oxide (ZnO) and zirconium doped zinc oxide (ZnO:Zr) thin films were deposited by reactive chemical pulverization spray pyrolysis technique on heated glass substrates at 450degC using zinc and zirconium chlorides as precursors. Effect of zirconium dopant and surface roughness on the nonlinear optical properties was investigated using atomic force microscopy (AFM) and third harmonic generation (THG).The best value of susceptibility chi(3) was obtained from the doped films with less roughness. A strong third order nonlinear optical susceptibility chi(3) = 20,49 times10-12 (esu) of the studied films was found for the 5% doped sample at 450degC.
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