MBE生长的gaas GRIN-SCH激光器的应变层

J. Ebner, T. Plant, J. R. Arthur
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引用次数: 0

摘要

在二极管激光器的有源区使用三元In化合物,可以构造出工作波长比二元砷化镓长得多的器件。如果这些In化合物包含在GaAs衬底上生长的结构中,那么它们需要保持足够薄(伪晶),以避免对器件性能产生不利影响的错配位错。以前已经报道了一些使用假晶InGaAs的激光器件(1,2),但没有与没有假晶层的等效结构进行比较。在这项工作中,比较了两种激光二极管结构:一种含有应变InGaAs,另一种在所有方面都相同,除了用未应变的GaAs代替应变InGaAs。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Strained Layer InGaAs GRIN-SCH Lasers Grown by MBE
The use of ternary In compounds in the active region of a diode laser allows devices to be constructed which operate at wavelengths longer than that obtainable from binary GaAs. If these In compounds are included in a structure grown on a GaAs substrate then they need to be kept thin enough (pseudomorphic) to avoid misfit dislocations which adversely affect device performance. A few lasing devices using pseudomorphic InGaAs have been reported previously (1,2) without comparison to the equivalent structure with no pseudomorphic layer. In this work two laser diode structures are compared: one containing strained InGaAs and the other identical in all respects except with unstrained GaAs in place of the strained InGaAs.
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