{"title":"Q/ subbd /对应力和试验结构参数的依赖性:综述","authors":"A. Martin, P. O'Sullivan, A. Mathewson","doi":"10.1109/IRWS.1997.660310","DOIUrl":null,"url":null,"abstract":"This paper gives a review of charge-to-breakdown data which has been reported in the literature for SiO/sub 2/ layers grown on single crystalline silicon. The different trends of charge-to-breakdown characteristics monitored for various stress conditions and structure designs are discussed. This work demonstrates that a good understanding of the stress method, the stress parameters and the test structures is essential for the correct interpretation of the charge-to-breakdown.","PeriodicalId":193522,"journal":{"name":"1997 IEEE International Integrated Reliability Workshop Final Report (Cat. No.97TH8319)","volume":"55 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-10-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Q/sub bd/ dependence on stress and test structure parameters: A review\",\"authors\":\"A. Martin, P. O'Sullivan, A. Mathewson\",\"doi\":\"10.1109/IRWS.1997.660310\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper gives a review of charge-to-breakdown data which has been reported in the literature for SiO/sub 2/ layers grown on single crystalline silicon. The different trends of charge-to-breakdown characteristics monitored for various stress conditions and structure designs are discussed. This work demonstrates that a good understanding of the stress method, the stress parameters and the test structures is essential for the correct interpretation of the charge-to-breakdown.\",\"PeriodicalId\":193522,\"journal\":{\"name\":\"1997 IEEE International Integrated Reliability Workshop Final Report (Cat. No.97TH8319)\",\"volume\":\"55 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-10-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1997 IEEE International Integrated Reliability Workshop Final Report (Cat. No.97TH8319)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IRWS.1997.660310\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1997 IEEE International Integrated Reliability Workshop Final Report (Cat. No.97TH8319)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRWS.1997.660310","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Q/sub bd/ dependence on stress and test structure parameters: A review
This paper gives a review of charge-to-breakdown data which has been reported in the literature for SiO/sub 2/ layers grown on single crystalline silicon. The different trends of charge-to-breakdown characteristics monitored for various stress conditions and structure designs are discussed. This work demonstrates that a good understanding of the stress method, the stress parameters and the test structures is essential for the correct interpretation of the charge-to-breakdown.