散射模板掩模中掩模散射电子的空间分布

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI:10.1109/IMNC.1999.797461

H. Yamashita, S. Manako, E. Nomura, K. Nakajima, H. Nozue

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引用次数: 0

摘要

电子束(EB)投影方法，如SCALPEL和胜诉是候选的下一代光刻。在这些方法中，使用EB掩模来获得高通量的曝光系统。吸收体或散射体与这些掩模的开口或膜相结合，在晶圆上产生图像对比度。

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Spatial distribution of mask-scattered electrons through scattering stencil mask

Electron-beam (EB) projection methods, such as SCALPEL and PREVAIL are among the candidates for next generation lithography. In these methods, EB masks are used to gain high throughput of the exposure systems. Absorber or scatterer combining with opening or membrane of those masks are structured to produce an image contrast on the wafer.

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Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference

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