lnGaAs激光材料带结构的电光研究

A. Jaeger, G. Weiser
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引用次数: 0

摘要

图2与图1相同的氧化铝/氧化钛多层膜的实验和计算反射率随入射角的变化关系。位于日本冈崎分子科学研究所紫外同步辐射设施(UVSOR)的750 mev电子存储环的首线5B的单色同步辐射。计算反射率(虚线)也显示出与实验值几乎相同的32%左右的反射率。实验反射率在2.734 nm处的半最大值全宽为0.0381 nm,对应的A M = 0.0139。图2为与图1相同的氧化铝-氧化基铝多层材料的反射率随软x射线入射角变化的实验图和计算曲线。实验结果与计算结果吻合较好。反射率在71.8'处的半最大值的全宽度约为1.0'。*日本庆应义塾大学科学技术学院电子工程系,日本神奈川县广北区日吉3-14-1T. W. Barhee, Jr. S. Morowka, M. C. Hettrick, apple。选择24 883(1985)。2. 熊谷,松本,河村,丰田,大原,Jpn。j:。物理学33,7086(1994)。熊谷,丰田,松本,大原,Jpn。j:。物理学报32,6137(1993)。熊谷,丰田,苹果。冲浪。科学82/83,481(1994)。熊谷,M.松本,K.丰田,M. Obara, M. Suzuki,薄膜,263,47(1995)。3.
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Electro-optic study of the bandstructure of lnGaAs laser materia
CWF44 Fig. 2 Experimental and calculated reflectances of the same aluminum oxide/ titanium oxide multilayer as that in Fig. 1 as a function of incident angle. monochromatized synchrotron radiation from the heamline 5B of the 750-MeV electron storage ring located at the Ultraviolet Synchrotron Radiation Facility (UVSOR), Institute for Molecular Science, Okazaki, Japan. The calculated reflectances (dashed curve) also show almost the same reflectances around 32% as the experimental ones. The full width of the half maximum of the experimental reflectances at 2.734 nm is 0.0381 nm, corresponding to A M = 0.0139. Figure 2 shows experimental plots and the calculated curve of the dependence of reflectances of the same aluminum oxidekitanium oxide multilayer as that in Fig. 1 on incident angle of the soft-X ray. The experimental plots agree well with the calculation. Full width of the half maximum of the reflectance at 71.8'is about 1.0'. *Department of Electrical Engineering, Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Kanagawa223, Japan 1. T. W. Barhee, Jr., S. Morowka, M. C. Hettrick, Appl. Opt. 24,883 (1985). 2. H. Kumagai, M. Matsumoto, Y. Kawamura, K. Toyoda, M. Obara, Jpn. J. Appl. Phys. 33,7086 (1994). H. Kumagai, K. Toyoda, M. Matsumoto, M. Obara, Jpn. J. Appl. Phys. 32, 6137 (1993). H. Kumagai, K. Toyoda, Appl. Surf. Sci. 82/83,481 (1994). H. Kumagai, M. Matsumoto, K. Toyoda, M. Obara, M. Suzuki, Thin Solid Films 263,47 (1995). 3.
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