理想二极管的设计

D. Ma, J. Xing
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引用次数: 3

摘要

本文介绍了一种p沟道MOSFET理想二极管电路。连接输入和输出的p沟道MOSFET导通电阻在电路中仅为100mΩ。为了保证从输入到输出的降压等于V1(当I1 = 2A时,V1 = 256mV),电路采用高增益放大器调节p沟道MOS晶体管(MP0)的栅极电压。该电路还使用了一个高侧电流传感比较器来限制流过p沟道MOSFET的电流。正向最大漏电流为2A,反向最大漏电流为2μA。给出并讨论了0.5μm BCD工艺的仿真结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The design of ideal diode
This article describes a P-channel MOSFET ideal diode circuit. The P-channel MOSFET on-resistance that connects the input and output is only 100mΩ in the circuit. In order to ensure the drop voltage from the input to the output is equal to V1(when I1 = 2A, V1 = 256mV), the circuit uses a high-gain amplifier to adjust the gate voltage of the P-channel MOS transistor(MP0). And the circuit also uses a high side current sensing comparator to limit the current that flows through the P-channel MOSFET. The maximum forward current achieves 2A, and the maximum reverse leakage current is 2μA. Simulation results using a 0.5μm BCD process are presented and discussed.
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