{"title":"SOI DRAM的特点和可能性","authors":"Y. Yamaguchi, Y. Inoue","doi":"10.1109/SOI.1995.526491","DOIUrl":null,"url":null,"abstract":"An SOI DRAM is a candidate for giga-bit scale DRAM with improved data retention characteristics and/or simple capacitor structure achieved by low leakage current, reduced soft error effect and low Cb/Cs ratio. The SOI DRAM is also expected to realize low-voltage memory which will be used in handy systems in a forthcoming multimedia era by reduced junction capacitance and back-gate-bias effect. However, some drawbacks are also suspected owing to floating substrate effects. In the present report, these features are summarized to demonstrate the perspective on SOI DRAM.","PeriodicalId":149490,"journal":{"name":"1995 IEEE International SOI Conference Proceedings","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1995-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"SOI DRAM: its features and possibility\",\"authors\":\"Y. Yamaguchi, Y. Inoue\",\"doi\":\"10.1109/SOI.1995.526491\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An SOI DRAM is a candidate for giga-bit scale DRAM with improved data retention characteristics and/or simple capacitor structure achieved by low leakage current, reduced soft error effect and low Cb/Cs ratio. The SOI DRAM is also expected to realize low-voltage memory which will be used in handy systems in a forthcoming multimedia era by reduced junction capacitance and back-gate-bias effect. However, some drawbacks are also suspected owing to floating substrate effects. In the present report, these features are summarized to demonstrate the perspective on SOI DRAM.\",\"PeriodicalId\":149490,\"journal\":{\"name\":\"1995 IEEE International SOI Conference Proceedings\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-10-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1995 IEEE International SOI Conference Proceedings\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SOI.1995.526491\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1995 IEEE International SOI Conference Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOI.1995.526491","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
摘要
SOI DRAM是千兆级DRAM的候选产品,具有更好的数据保留特性和/或简单的电容器结构,通过低泄漏电流,减少软误差效应和低Cb/Cs比实现。SOI DRAM还有望通过降低结电容和反向偏置效应,实现在即将到来的多媒体时代的便携式系统中使用的低压存储器。然而,由于浮动衬底效应,也存在一些缺陷。在本报告中,总结了这些特点,以展示SOI DRAM的前景。
An SOI DRAM is a candidate for giga-bit scale DRAM with improved data retention characteristics and/or simple capacitor structure achieved by low leakage current, reduced soft error effect and low Cb/Cs ratio. The SOI DRAM is also expected to realize low-voltage memory which will be used in handy systems in a forthcoming multimedia era by reduced junction capacitance and back-gate-bias effect. However, some drawbacks are also suspected owing to floating substrate effects. In the present report, these features are summarized to demonstrate the perspective on SOI DRAM.