一套用于开发CMOS-MEMS技术的测试结构

2016 13th International Conference on Electrical Engineering, Computing Science and Automatic Control (CCE) Pub Date : 2016-09-01 DOI:10.1109/ICEEE.2016.7751206

C. Álvarez, M. L. Aranda, A. Torres-Jácome, W. C. Arriaga, Javier de la Hidalga Wade

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引用次数: 0

摘要

在这项工作中，提出了一套测试结构，以满足在晶圆级对微机电系统(MEMS)集成过程监控和材料/器件特性测量的新需求。CMOS-MEMS测试结构旨在评估和协助集成CMOS-MEMS工艺的开发。从测试结构中获得的数据将有助于识别由于制造过程而导致的材料性能和器件性能的可能的电气和/或机械变化。

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A set of test structures for the development of a CMOS-MEMS technology

In this work, a set of test structures that meets the emerging need for Micro-Electro-Mechanical Systems (MEMS) integration process monitoring and material/device property measurement at the wafer level is presented. The CMOS-MEMS test structures are designed to evaluate and assist the development of an integrated CMOS-MEMS process. The acquired data from the test structures will be useful for identifying the possible electrical and/or mechanical variations on the material properties and devices performance due to the fabrication process.

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来源期刊

2016 13th International Conference on Electrical Engineering, Computing Science and Automatic Control (CCE)

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