用含b -还原剂溶液直接电沉积超软和高磁矩咖啡膜

B. Zong, G. Han, J. Qiu, Zaibing Guo, Li Wang, W. Yeo, Bo Liu
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引用次数: 5

摘要

介绍了一种在半中性硫酸铁溶液中直接电沉积制备超软铁纳米/微膜的方法。添加硼还原剂后,CoFe膜变得非常柔软,磁矩高。通常情况下,薄膜在易轴和硬轴的矫顽力分别为6.5和2.5 Oersted,饱和极化平均可达2.45 Tesla。尽管薄膜很柔软,但这些光滑闪亮的薄膜仍然表现出~45 osted的高各向异性场,渗透率高达1 0 4。这种薄膜可以潜在地用于当前和未来的磁记录系统以及微电子和生物技术设备。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Ultrasoft and High Magnetic Moment CoFe Films Directly Electrodeposited from a B-Reducer Contained Solution
A methodology to fabricate ultrasoft CoFe nano-/microfilms directly via electrodeposition from a semineutral iron sulfate solution is demonstrated. Using boron-reducer as the additive, the CoFe films become very soft with high magnetic moment. Typically, the film coercivity in the easy and hard axes is 6.5 and 2.5 Oersted, respectively, with a saturation polarization up to an average of 2.45 Tesla. Despite the softness, these shining and smooth films still display a high-anisotropic field of ~45 Oersted with permeability up to 1 0 4 . This kind of films can potentially be used in current and future magnetic recording systems as well as microelectronic and biotechnological devices.
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