模内参数波动对未来最大时钟频率分布的影响

K. Bowman, J. Meindl
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引用次数: 46

摘要

通过采用严格推导的器件和电路模型来计算由模对模和模内波动引起的关键路径延迟分布,评估参数波动对未来电路性能的影响。利用这些分布和最近得到的经测量数据验证的FMAX分布模型,预测了180、130、100、70和50 nm技术世代的芯片内波动对FMAX平均值的影响。系统的模内波动是由参数波动引起的最大的性能下降。假设3/spl sigma/通道长度偏差为20%,对50 nm技术一代的预测表明,由于系统的芯片内波动,一代的性能增益可能会损失。这种分析应该鼓励努力加强模内工艺控制和开发电路设计方法,以抑制模内参数波动对电路性能的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impact of within-die parameter fluctuations on future maximum clock frequency distributions
The impact of parameter fluctuations on future circuit performance is evaluated by employing rigorously derived device and circuit models to calculate the critical path delay distributions resulting from die-to-die and within-die fluctuations. Utilizing these distributions with a recently derived FMAX distribution model validated by measured data, the effect of within-die fluctuations on the FMAX mean is forecast for the 180, 130, 100, 70 and 50 nm technology generations. Systematic within-die fluctuations impose the largest performance degradation resulting from parameter fluctuations. Assuming a 3/spl sigma/ channel length deviation of 20%, projections for the 50 nm technology generation indicate that essentially a generation of performance gain can be lost due to systematic within-die fluctuations. This analysis should encourage efforts toward tightening within-die process controls and developing circuit design methodologies that suppress the impact of within-die parameter fluctuations on circuit performance.
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