{"title":"模内参数波动对未来最大时钟频率分布的影响","authors":"K. Bowman, J. Meindl","doi":"10.1109/CICC.2001.929761","DOIUrl":null,"url":null,"abstract":"The impact of parameter fluctuations on future circuit performance is evaluated by employing rigorously derived device and circuit models to calculate the critical path delay distributions resulting from die-to-die and within-die fluctuations. Utilizing these distributions with a recently derived FMAX distribution model validated by measured data, the effect of within-die fluctuations on the FMAX mean is forecast for the 180, 130, 100, 70 and 50 nm technology generations. Systematic within-die fluctuations impose the largest performance degradation resulting from parameter fluctuations. Assuming a 3/spl sigma/ channel length deviation of 20%, projections for the 50 nm technology generation indicate that essentially a generation of performance gain can be lost due to systematic within-die fluctuations. This analysis should encourage efforts toward tightening within-die process controls and developing circuit design methodologies that suppress the impact of within-die parameter fluctuations on circuit performance.","PeriodicalId":101717,"journal":{"name":"Proceedings of the IEEE 2001 Custom Integrated Circuits Conference (Cat. No.01CH37169)","volume":"370 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-05-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"46","resultStr":"{\"title\":\"Impact of within-die parameter fluctuations on future maximum clock frequency distributions\",\"authors\":\"K. Bowman, J. Meindl\",\"doi\":\"10.1109/CICC.2001.929761\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The impact of parameter fluctuations on future circuit performance is evaluated by employing rigorously derived device and circuit models to calculate the critical path delay distributions resulting from die-to-die and within-die fluctuations. Utilizing these distributions with a recently derived FMAX distribution model validated by measured data, the effect of within-die fluctuations on the FMAX mean is forecast for the 180, 130, 100, 70 and 50 nm technology generations. Systematic within-die fluctuations impose the largest performance degradation resulting from parameter fluctuations. Assuming a 3/spl sigma/ channel length deviation of 20%, projections for the 50 nm technology generation indicate that essentially a generation of performance gain can be lost due to systematic within-die fluctuations. This analysis should encourage efforts toward tightening within-die process controls and developing circuit design methodologies that suppress the impact of within-die parameter fluctuations on circuit performance.\",\"PeriodicalId\":101717,\"journal\":{\"name\":\"Proceedings of the IEEE 2001 Custom Integrated Circuits Conference (Cat. No.01CH37169)\",\"volume\":\"370 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2001-05-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"46\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of the IEEE 2001 Custom Integrated Circuits Conference (Cat. No.01CH37169)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CICC.2001.929761\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the IEEE 2001 Custom Integrated Circuits Conference (Cat. No.01CH37169)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CICC.2001.929761","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Impact of within-die parameter fluctuations on future maximum clock frequency distributions
The impact of parameter fluctuations on future circuit performance is evaluated by employing rigorously derived device and circuit models to calculate the critical path delay distributions resulting from die-to-die and within-die fluctuations. Utilizing these distributions with a recently derived FMAX distribution model validated by measured data, the effect of within-die fluctuations on the FMAX mean is forecast for the 180, 130, 100, 70 and 50 nm technology generations. Systematic within-die fluctuations impose the largest performance degradation resulting from parameter fluctuations. Assuming a 3/spl sigma/ channel length deviation of 20%, projections for the 50 nm technology generation indicate that essentially a generation of performance gain can be lost due to systematic within-die fluctuations. This analysis should encourage efforts toward tightening within-die process controls and developing circuit design methodologies that suppress the impact of within-die parameter fluctuations on circuit performance.