PNP SiGe:低成本CBiCMOS工艺中的C - HBT优化

D. Knoll, B. Heinemann, Y. Yamamoto, H. Wulf, D. Schmidt
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引用次数: 7

摘要

我们提出了一种低成本、互补的SiGe:C BiCMOS工艺的pnp晶体管优化结果。一个特别的目标是提供pnp和npn器件的良好匹配参数。在不影响低频噪声行为的情况下,达到了100的高pnp晶体管电流增益。提出了两种类型的pnp晶体管,其BVCEO值分别为3.3 V和4.5 V, BVCEO乘以fT的乘积超过260 VGHz, fmax值高达105 GHz, 5 GHz时的最小噪声系数为1.2 dB。这些pnp数据与该CBiCMOS工艺中可用的中压npn晶体管的数据非常吻合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
PNP SiGe: C HBT Optimization in a Low-Cost CBiCMOS Process
We present results of pnp transistor optimization in a low-cost, complementary SiGe:C BiCMOS process. A particular goal was to provide well matched parameters of pnp and npn devices. A high pnp transistor current gain of 100 was reached without compromising the LF noise behavior. Two types of pnp transistors are presented showing BVCEO values of 3.3 V and 4.5 V, respectively, a (BVCEO times fT) product in excess of 260 VGHz, fmax values up to 105 GHz, and a minimum noise figure of 1.2 dB at 5 GHz. These pnp data fit well to the data of the medium-voltage npn transistors also available in this CBiCMOS process.
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