{"title":"在CMOS技术中通过布局设计硬化了一种替代辐射","authors":"Carlos Alfredo Pelcastre Ortega, M. L. Aranda","doi":"10.1109/LAEDC54796.2022.9908181","DOIUrl":null,"url":null,"abstract":"Electronic circuits used in aerospace industry, particle physics research, and medical equipment need to work in radioactive environments and long-term exposure to radiation causes degradation of their electrical properties. One of the causes of device degradation is the effect of the total ionizing dose (TID). The accumulation of positive charges in silicon oxide (SiO2) is the main problem that generates the TID, the accumulation of charges causes changes in the threshold voltage, leakage current and the generation of parasitic transistors between N-type regions. To reduce the degradation caused by TID, several techniques have been researched, one of which is radiation hardening by design (RHBD). This paper presents a new layout technique named hourglass transistor; this new layout improves the radiation response to TID. The behavior of devices with the new layout was analyzed using 3D simulations with physical models, and a 130nm CMOS technology.","PeriodicalId":276855,"journal":{"name":"2022 IEEE Latin American Electron Devices Conference (LAEDC)","volume":"3 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-07-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"An alternative radiation hardened by layout design in a CMOS technology\",\"authors\":\"Carlos Alfredo Pelcastre Ortega, M. L. Aranda\",\"doi\":\"10.1109/LAEDC54796.2022.9908181\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Electronic circuits used in aerospace industry, particle physics research, and medical equipment need to work in radioactive environments and long-term exposure to radiation causes degradation of their electrical properties. One of the causes of device degradation is the effect of the total ionizing dose (TID). The accumulation of positive charges in silicon oxide (SiO2) is the main problem that generates the TID, the accumulation of charges causes changes in the threshold voltage, leakage current and the generation of parasitic transistors between N-type regions. To reduce the degradation caused by TID, several techniques have been researched, one of which is radiation hardening by design (RHBD). This paper presents a new layout technique named hourglass transistor; this new layout improves the radiation response to TID. The behavior of devices with the new layout was analyzed using 3D simulations with physical models, and a 130nm CMOS technology.\",\"PeriodicalId\":276855,\"journal\":{\"name\":\"2022 IEEE Latin American Electron Devices Conference (LAEDC)\",\"volume\":\"3 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-07-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2022 IEEE Latin American Electron Devices Conference (LAEDC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/LAEDC54796.2022.9908181\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 IEEE Latin American Electron Devices Conference (LAEDC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/LAEDC54796.2022.9908181","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
An alternative radiation hardened by layout design in a CMOS technology
Electronic circuits used in aerospace industry, particle physics research, and medical equipment need to work in radioactive environments and long-term exposure to radiation causes degradation of their electrical properties. One of the causes of device degradation is the effect of the total ionizing dose (TID). The accumulation of positive charges in silicon oxide (SiO2) is the main problem that generates the TID, the accumulation of charges causes changes in the threshold voltage, leakage current and the generation of parasitic transistors between N-type regions. To reduce the degradation caused by TID, several techniques have been researched, one of which is radiation hardening by design (RHBD). This paper presents a new layout technique named hourglass transistor; this new layout improves the radiation response to TID. The behavior of devices with the new layout was analyzed using 3D simulations with physical models, and a 130nm CMOS technology.