AlInAs/GaInAs/InP高频场效应管的射频和微波噪声建模

P. Sakalas, A. Mellberg, H. Zirath, N. Rorsman, E. Choumas
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引用次数: 0

摘要

采用分子束外延的方法,在晶格匹配结构上制备了AlInAs/GaInAs/InP hemt。在210 mA/mm的漏极电流下,获得了a g/sub /=840 mS/mm的外在跨导。研究了InP高频场效应管在2 ~ 26ghz频段的射频和微波噪声性能。采用“冷”场效应管方法提取小信号模型参数。AlInAs/GaInAs/InP HEMTs表现出良好的射频和噪声性能(f/sub t/=118 GHz, f/sub max/=245 GHz, NFmin=0.4 dB, NFmin=1.3 dB)。利用与栅极泄漏引起的电流噪声源相关的Pospieszalski噪声模型来解释测量的噪声参数。在AlInAs/GaInAs/InP hemt中,良好的噪声特性可以解释为低栅极电阻和由于宽量子阱(300 /spl)通道中的电子限制而抑制晶体管工作偏置时的实际空间输运。模拟结果误差在4%以内。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
RF and microwave noise modeling of AlInAs/GaInAs/InP HFETs
AlInAs/GaInAs/InP HEMTs were fabricated on a lattice-matched structure, grown by molecular beam epitaxy. An extrinsic transconductance of a g/sub m/=840 mS/mm was obtained at a drain current of 210 mA/mm. RF and microwave noise performance of InP HFETs were investigated in the 2-26 GHz frequency band. Small-signal model parameters were extracted by using the "cold" FET method. AlInAs/GaInAs/InP HEMTs exhibited good RF and noise performance, (f/sub t/=118 GHz, f/sub max/=245 GHz and NFmin=0.4 dB at 2 GHz and NFmin=1.3 dB at 26 GHz). The Pospieszalski noise model in association with a current noise source due to the gate leakage was exploited to account for the measured noise parameters. The good noise characteristics in AlInAs/GaInAs/InP HEMTs can be explained by the low gate resistance and by the suppression of real space transport at the bias of transistor operation due to confinement of electrons in the wide quantum well (300 /spl Aring/) channel. Simulated results gave an error within less than 4%.
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