等离子体材料处理的先进概念和体系结构

O. Baranov, I. Levchenko, Shuyan Xu, K. Bazaka
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引用次数: 0

摘要

基于等离子体的技术在材料加工、高级纳米合成和纳米制造领域得到了广泛而成功的应用。基于等离子体或通过使用等离子体增强的当前可用处理体系结构的多样性是巨大的,人们很容易迷失在每种配置所提供的机会中。这本迷你书提供了最重要的概念和结构在等离子体辅助材料处理的简明大纲,帮助读者通过等离子体系统的选择和优化的基本原理导航。本书中讨论的架构范围从相对简单,用户友好的等离子体类型,使用直流,射频,微波和电弧系统,到更复杂的基于集成和外部基板架构的先进系统,以及配置磁场和分布等离子体源的复杂控制机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Advanced Concepts and Architectures for Plasma-Enabled Material Processing
Plasma-based techniques are widely and successfully used across the field of materials processing, advanced nanosynthesis, and nanofabrication. The diversity of currently available processing architectures based on or enhanced by the use of plasmas is vast, and one can easily get lost in the opportunities presented by each of these configurations. This mini-book provides a concise outline of the most important concepts and architectures in plasma-assisted processing of materials, helping the reader navigate through the fundamentals of plasma system selection and optimization. Architectures discussed in this book range from the relatively simple, user-friendly types of plasmas produced using direct current, radio-frequency, microwave, and arc systems, to more sophisticated advanced systems based on incorporating and external substrate architectures, and complex control mechanisms of configured magnetic fields and distributed plasma sources.
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