EUVL中耀斑建模与补偿方法

Lithography Asia Pub Date : 2008-12-04 DOI:10.1117/12.804673
Insung Kim, Hoyoung Kang, Chang-min Park, Joo-on Park, Jeong-Hoon Lee, Jinhong Park, Doohoon Goo, J. Yeo, Seong-woon Choi, W. Han
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引用次数: 6

摘要

据报道,在极紫外光反射光学中,由于耀斑与波长四阶成反比的特性,它具有非常高的远距离效应。高强度耀斑会在天线方向图密度梯度较大的区域产生临界维数(CD)变化问题,而远距离影响特性对于光学接近校正(OPC)建模或其他任何适应这种远距离影响的实际方法都将面临计算难题。此外,还存在另一个重大挑战,即如何足够精确地测量和表征这种远距离耀斑,使所表征的耀斑能够成功地用于标准OPC流中的补偿。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Methodology of flare modeling and compensation in EUVL
Flare in EUV mirror optics has been reported to be very high and long range effect due to its character which is inversely proportional to the 4th order of wavelength. The high level of flare will generate CD (Critical Dimension) variation problem in the area where the gradient of aerial pattern density is large while the long range influencing character would confront an issue of computational challenge either for OPC (Optical Proximity Correction) modeling or for any other practical ways to accommodate such a long range effect. There also exists another substantial challenge of measuring and characterizing such a long range flare accurately enough so that the characterized flare can successfully be used for the compensation in the standard OPC flow.
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