M. Gospodinova, R. Arnaudov, V.S. Mollov, P. Philippov
{"title":"硅衬底上MCM-D中al损耗线的高频效应","authors":"M. Gospodinova, R. Arnaudov, V.S. Mollov, P. Philippov","doi":"10.1109/ICMEL.2000.838799","DOIUrl":null,"url":null,"abstract":"This paper discusses an experimental investigation of the behavior of high-speed Si/SiO/sub 2//Al based microstrip, when an extra DC bias voltage is applied to the line. In order to reduce the insertion losses caused by the semiconductor substrate, we suggest a superposition of a DC biasing to the high-speed signal applied to the line. This way, the conductor line changes the surface properties of the semiconductor substrate. To provide the characterization of this effect a number of test structures containing a variety of microstrip asymmetric transmission lines were prepared. The obtained results suggest a way of controlling the performance and energy propagation of interconnects on semiconductor substrates. The studied effect can be successfully applied in high-speed blocks with tuning parameters.","PeriodicalId":215956,"journal":{"name":"2000 22nd International Conference on Microelectronics. Proceedings (Cat. No.00TH8400)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-05-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"High-frequency effects of Al-lossy lines in MCM-D on silicon substrate\",\"authors\":\"M. Gospodinova, R. Arnaudov, V.S. Mollov, P. Philippov\",\"doi\":\"10.1109/ICMEL.2000.838799\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper discusses an experimental investigation of the behavior of high-speed Si/SiO/sub 2//Al based microstrip, when an extra DC bias voltage is applied to the line. In order to reduce the insertion losses caused by the semiconductor substrate, we suggest a superposition of a DC biasing to the high-speed signal applied to the line. This way, the conductor line changes the surface properties of the semiconductor substrate. To provide the characterization of this effect a number of test structures containing a variety of microstrip asymmetric transmission lines were prepared. The obtained results suggest a way of controlling the performance and energy propagation of interconnects on semiconductor substrates. The studied effect can be successfully applied in high-speed blocks with tuning parameters.\",\"PeriodicalId\":215956,\"journal\":{\"name\":\"2000 22nd International Conference on Microelectronics. Proceedings (Cat. No.00TH8400)\",\"volume\":\"9 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-05-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2000 22nd International Conference on Microelectronics. Proceedings (Cat. No.00TH8400)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICMEL.2000.838799\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2000 22nd International Conference on Microelectronics. Proceedings (Cat. No.00TH8400)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICMEL.2000.838799","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
High-frequency effects of Al-lossy lines in MCM-D on silicon substrate
This paper discusses an experimental investigation of the behavior of high-speed Si/SiO/sub 2//Al based microstrip, when an extra DC bias voltage is applied to the line. In order to reduce the insertion losses caused by the semiconductor substrate, we suggest a superposition of a DC biasing to the high-speed signal applied to the line. This way, the conductor line changes the surface properties of the semiconductor substrate. To provide the characterization of this effect a number of test structures containing a variety of microstrip asymmetric transmission lines were prepared. The obtained results suggest a way of controlling the performance and energy propagation of interconnects on semiconductor substrates. The studied effect can be successfully applied in high-speed blocks with tuning parameters.