质子辐射对SOI FinFET晶体管效率和单位增益频率权衡的影响

L. Caparroz, J. Martino, E. Simoen, C. Claeys, P. Agopian
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引用次数: 3

摘要

本文基于器件反转系数(IC)研究了质子辐射对SOI FinFET模拟参数的影响。重点分析了模拟设计中晶体管效率、单位增益频率和本征电压增益等指标。虽然质子辐射会影响器件性能,但在考虑辐射影响的情况下,通过对反演系数的分析,可以确定最优模拟条件。与p通道设备相比,n通道设备以不同的方式受到影响,这可能取决于应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Proton radiation influence on SOI FinFET trade-off between transistor efficiency and unit gain frequency
This paper studies the proton radiation influence on SOI FinFET analog parameters based on the device inversion coefficient (IC). The analysis focuses on some figures of merit in analog design like the transistor efficiency, the unity gain frequency and the intrinsic voltage gain. Although the proton radiation affects the device performance, it is possible to define an optimal analog condition by basing the analysis on the inversion coefficient, even considering the radiation impact. N-channel devices are affected in a different manner when compared to p-channel counterparts, which can be decisive depending on the application.
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