用于CMOS千兆级集成(GSI)完全功率延迟分析的低功率跨区域MOSFET模型

B. Austin, Keith A Bowman, Xinghai Tang, James D. Meindl
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引用次数: 40

摘要

介绍了一种新的紧凑的跨区域模型,用于传统表面沟道反转mosfet在区域边界具有连续和平滑的跃迁。该模型通过MEDICI和HSPICE验证,描述了所有操作区域,即亚阈值、线性和饱和,同时包括1)载流子速度饱和的影响,2)垂直和横向高场迁移率退化,以及3)阈值电压滚降,这些都是亚微米器件的突出特征。该模型的关键贡献是对电压缩放带来的开/关电流权衡的物理洞察,这对未来的低功耗设计至关重要。利用该模型对CMOS电路设计进行完整的功率延迟分析,推导出以下解析表达式:1)传播延迟,2)短路功率(P/sub SC/), 3)静态功率(P/sub static /)。总功耗(P/sub total /)消耗分析结果表明,在未来低功耗高性能CMOS GSI中,P/sub SC/和P/sub Static/可能占P/sub total /的1/3以上。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A low power transregional MOSFET model for complete power-delay analysis of CMOS gigascale integration (GSI)
A new compact transregional model for conventional surface channel inversion MOSFETs with continuous and smooth transitions at regional boundaries is introduced. The model, verified against MEDICI and HSPICE, describes all regions of operation, namely, subthreshold, linear, and saturation while including the effects of 1) carrier velocity saturation, 2) vertical and lateral high field mobility degradation, and 3) threshold voltage roll-off, all prominent characteristics of sub-micron devices. The key contribution of this model is the physical insight into the on/off current trade-off that ensues with voltage scaling and will be vital to future low power design. Utilizing the model for a complete power-delay analysis of CMOS circuit designs, analytical expressions are derived for: 1) propagation delay, 2) short circuit power (P/sub SC/), and 3) static power (P/sub Static/). Results from the total power (P/sub Total/) consumption analysis indicate that P/sub SC/ and P/sub Static/ may constitute over 1/3 of P/sub Total/ in future low power/high performance CMOS GSI.
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