用于混合纳米/ cmos存储器的阻性纳米横条的基本分析

A. Flocke, T. Noll
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引用次数: 133

摘要

作为CMOS存储器的可能的后继者,以交叉杆结构组织的迟滞材料目前正在研究中。在这里,被动材料是特别重要的,因为它们保持其功能,即使缩小到纳米领域。由于其规律性和固有的器件密度,所谓的纳米级交叉条似乎对超越当前ITRS-CMOS路线图范围的未来组件非常有趣。但是,由于它们的被动行为,如果没有恢复信号电平的有源设备,它们将无法自行操作。这项工作研究了电阻滞后横条由于其本身的性质而面临的限制,以及CMOS读电路必须提供什么样的性能才能使混合电路成为一种功能新颖的技术。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fundamental analysis of resistive nano-crossbars for the use in hybrid Nano/CMOS-memory
As a possible successor for CMOS memory, hysteretic materials organized in crossbar structures are currently being investigated. Here, passive materials are of special importance as they maintain their functionality even when scaled down to the nanometer domain. With their regularity and inherent device density so-called nano-scaled crossbars seem to be very interesting for future components beyond the present scope of the ITRS-CMOS roadmap. But, due to their passive behavior they will not be capable of operating on their own without active devices that restore signal levels. This work investigates the limitations resistive hysteretic crossbars face due to their very nature and what performance CMOS read circuits will have to offer to let hybrid circuits result in a functional new technology.
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