基于模式介质的磁碟系统力学性能研究

S. Shen, Bo Liu, Shengkai Yu, H. Du
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引用次数: 4

摘要

在追求向10 Tb/in2的面记录密度的过程中,图案化介质技术以及减小滑块和磁盘之间磁间距的技术引起了人们的极大关注。因此,在磁头-磁盘接口(HDI)处可能会遇到接触应力。因此,对粗糙微接触处非弹性变形引起的应力分布的详细了解是非常重要的。本文提出了一种基于有限元模型和两种典型模式介质的HDI弹塑性接触分析方法。采用两种典型模式介质对粗糙微接触压力和地下von Mises等效应力的模拟结果进行了解释。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Mechanical performance study of pattern media based head-disk systems
In the pursuit of areal recording densities towards 10 Tb/in2, patterned media technology as well as the technology to reduce magnetic spacing between the slider and disk have attracted great attention. As a result, contact stresses can be encountered at the head-disk interface (HDI). Detailed knowledge of the stress distribution due to inelastic deformation at asperity microcontacts is therefore of great importance. An elastic-plastic contact analysis for the HDI that is based on a finite element model and two typical pattern media cases is presented in this work. Simulation results for the contact pressure at asperity microcontacts and subsurface von Mises equivalent stress are interpreted in terms of two typical pattern media cases.
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