缓冲俘获对氮化镓场效应管脉冲I-V曲线和电流崩塌影响的数值分析

H. Nakano, H. Takayanagi, K. Yonemoto, K. Horio
{"title":"缓冲俘获对氮化镓场效应管脉冲I-V曲线和电流崩塌影响的数值分析","authors":"H. Nakano, H. Takayanagi, K. Yonemoto, K. Horio","doi":"10.1109/CSICS.2005.1531789","DOIUrl":null,"url":null,"abstract":"Two-dimensional transient analysis of GaN MESFETs is performed in which a three-level compensation model is adopted for a semi-insulating buffer layer, where a shallow donor, a deep donor and a deep acceptor are considered. Quasi-pulsed I-V curves are derived from the transient characteristics, and are compared with the steady-state I-V curves. It is shown that so-called current collapse or current reduction is more pronounced when the deep-acceptor density in the buffer layer is higher and when an off-state drain voltage is higher, because the trapping effects become more significant. It is suggested that to minimize current collapse in GaN-based FETs, an acceptor density in a semi-insulating GaN layer should be made low, although the current cutoff behaviour may be degraded.","PeriodicalId":149955,"journal":{"name":"IEEE Compound Semiconductor Integrated Circuit Symposium, 2005. CSIC '05.","volume":"22 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Numerical analysis of pulsed I-V curves and current collapse in GaN FETs as affected by buffer trapping\",\"authors\":\"H. Nakano, H. Takayanagi, K. Yonemoto, K. Horio\",\"doi\":\"10.1109/CSICS.2005.1531789\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Two-dimensional transient analysis of GaN MESFETs is performed in which a three-level compensation model is adopted for a semi-insulating buffer layer, where a shallow donor, a deep donor and a deep acceptor are considered. Quasi-pulsed I-V curves are derived from the transient characteristics, and are compared with the steady-state I-V curves. It is shown that so-called current collapse or current reduction is more pronounced when the deep-acceptor density in the buffer layer is higher and when an off-state drain voltage is higher, because the trapping effects become more significant. It is suggested that to minimize current collapse in GaN-based FETs, an acceptor density in a semi-insulating GaN layer should be made low, although the current cutoff behaviour may be degraded.\",\"PeriodicalId\":149955,\"journal\":{\"name\":\"IEEE Compound Semiconductor Integrated Circuit Symposium, 2005. CSIC '05.\",\"volume\":\"22 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2005-12-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Compound Semiconductor Integrated Circuit Symposium, 2005. CSIC '05.\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CSICS.2005.1531789\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Compound Semiconductor Integrated Circuit Symposium, 2005. CSIC '05.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CSICS.2005.1531789","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

本文对氮化镓mesfet进行了二维瞬态分析,其中半绝缘缓冲层采用三电平补偿模型,其中考虑了浅给体、深给体和深受体。从瞬态特性出发,导出了准脉冲I-V曲线,并与稳态I-V曲线进行了比较。结果表明,当缓冲层中深层受体密度较高和失态漏极电压较高时,所谓的电流塌陷或电流减小更为明显,因为俘获效应变得更加显著。本文建议,为了使氮化镓基fet中的电流崩溃最小化,半绝缘氮化镓层中的受体密度应该降低,尽管电流截止行为可能会降低。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Numerical analysis of pulsed I-V curves and current collapse in GaN FETs as affected by buffer trapping
Two-dimensional transient analysis of GaN MESFETs is performed in which a three-level compensation model is adopted for a semi-insulating buffer layer, where a shallow donor, a deep donor and a deep acceptor are considered. Quasi-pulsed I-V curves are derived from the transient characteristics, and are compared with the steady-state I-V curves. It is shown that so-called current collapse or current reduction is more pronounced when the deep-acceptor density in the buffer layer is higher and when an off-state drain voltage is higher, because the trapping effects become more significant. It is suggested that to minimize current collapse in GaN-based FETs, an acceptor density in a semi-insulating GaN layer should be made low, although the current cutoff behaviour may be degraded.
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