采用90nm CMOS工艺实现片上电容低压差稳压器

I. S. V. Arancon, J. Hora
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引用次数: 3

摘要

本文设计并实现了一种采用90nm 1P9M 3.3V CMOS工艺的低压降稳压器。该设计主要由三级组成,即误差放大器、效率提升电路和利用功率PMOS的功率级。此外,该设计还采用片上电容解决了目前低压差稳压器外部电容器体积庞大的问题。采用补偿方案提供快速暂态和稳定。在本设计中使用的电容器不超过13pF,这使得设计人员可以轻松地将补偿电容器集成到LDO芯片中。设计的LDO有源面积为1.14μm2,地电流为94.2μA,压降电压为250mV。负载电流为150mA时,输入电压为2-3.6伏,输出电压为1.75伏。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
On-chip capacitor low dropout voltage regulator implemented in 90nm CMOS technology process
A low dropout voltage regulator designed and implemented in 90nm 1P9M 3.3V CMOS technology process is presented in this paper. The design consists mainly of three stages, namely, error amplifier, efficiency boosting circuit and a power stage which utilized a power PMOS. Moreover, the design employs a solution to bulky external capacitors of the present low dropout voltage regulators with an on-chip capacitor. Compensation scheme is also used to provide fast transient and stability. Capacitors used on this design doesn't exceed 13pF, this allows the designer to easily integrate the compensation capacitors within the LDO chip. The designed LDO has an active area of 1.14μm2 and a ground current of 94.2μA and a dropout voltage of 250mV. The input voltage is ranged from 2-3.6 volts for loading current of 150mA and the output of 1.75 volts.
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