{"title":"LPCVD反应器的计算机辅助配方生成","authors":"K.-K. Lin, C. Spanos","doi":"10.1109/ASMC.1990.111209","DOIUrl":null,"url":null,"abstract":"A computer-aided-design (CAD) system which has been developed to assist the process engineer in choosing the best compromise between product and equipment performance is described. A formal, systematic methodology that facilities the task of recipe design for low pressure chemical-vapor-deposition (LPCVD) reactors is discussed. Recipe generation via interactive response surface exploration and automatic recipe generation via numerical optimization are discussed.<<ETX>>","PeriodicalId":158760,"journal":{"name":"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop","volume":"45 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-09-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Computer-aided recipe generation for LPCVD reactors\",\"authors\":\"K.-K. Lin, C. Spanos\",\"doi\":\"10.1109/ASMC.1990.111209\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A computer-aided-design (CAD) system which has been developed to assist the process engineer in choosing the best compromise between product and equipment performance is described. A formal, systematic methodology that facilities the task of recipe design for low pressure chemical-vapor-deposition (LPCVD) reactors is discussed. Recipe generation via interactive response surface exploration and automatic recipe generation via numerical optimization are discussed.<<ETX>>\",\"PeriodicalId\":158760,\"journal\":{\"name\":\"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop\",\"volume\":\"45 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-09-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASMC.1990.111209\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE/SEMI Conference on Advanced Semiconductor Manufacturing Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1990.111209","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Computer-aided recipe generation for LPCVD reactors
A computer-aided-design (CAD) system which has been developed to assist the process engineer in choosing the best compromise between product and equipment performance is described. A formal, systematic methodology that facilities the task of recipe design for low pressure chemical-vapor-deposition (LPCVD) reactors is discussed. Recipe generation via interactive response surface exploration and automatic recipe generation via numerical optimization are discussed.<>
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