{"title":"薄膜中应变和应力的光学测量","authors":"S. Tamulevičius, L. Augulis, G. Laukaitis","doi":"10.1117/12.425439","DOIUrl":null,"url":null,"abstract":"Principles and applications of the cantilever technique to measure strain and stress in thin films are presented. Different optical interferometers were created and applied to control stress-thickness dependence during technological processes or to measure two-dimensional strain distribution in thin film. An original scheme combining advantages of the classical interferometer and electronic speckle pattern interferometer is presented.","PeriodicalId":365405,"journal":{"name":"International Conference on Solid State Crystals","volume":"73 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-04-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Optical measurements of strain and stress in thin films\",\"authors\":\"S. Tamulevičius, L. Augulis, G. Laukaitis\",\"doi\":\"10.1117/12.425439\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Principles and applications of the cantilever technique to measure strain and stress in thin films are presented. Different optical interferometers were created and applied to control stress-thickness dependence during technological processes or to measure two-dimensional strain distribution in thin film. An original scheme combining advantages of the classical interferometer and electronic speckle pattern interferometer is presented.\",\"PeriodicalId\":365405,\"journal\":{\"name\":\"International Conference on Solid State Crystals\",\"volume\":\"73 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2001-04-17\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Conference on Solid State Crystals\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.425439\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Solid State Crystals","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.425439","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Optical measurements of strain and stress in thin films
Principles and applications of the cantilever technique to measure strain and stress in thin films are presented. Different optical interferometers were created and applied to control stress-thickness dependence during technological processes or to measure two-dimensional strain distribution in thin film. An original scheme combining advantages of the classical interferometer and electronic speckle pattern interferometer is presented.
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