F. Daiminger, S. Heinemann, J. Nappi, M. Toivonen, H. Asonen
{"title":"100w无铝连续波808nm线性棒阵列","authors":"F. Daiminger, S. Heinemann, J. Nappi, M. Toivonen, H. Asonen","doi":"10.1109/CLEO.1997.603475","DOIUrl":null,"url":null,"abstract":"limited by thermal effects resulting from UV absorption. We expect an improvement in the 213 nm output power when longer CLBO crystals are used. Corresponding experiments are in preparation. However, fundamental problems in the CLBO crystal fabrication must be solved. Melt grown BBO' with reduced absorption may be a viable alternative. Part of this research was supported by the BMBF contracts 13N 6547/6 and 16 SV 559. 1. L.Y. Liu, W. Wiechmann, M. Oka, Y. Taguchi, H. Wada, Y. Minoya, T. Okamoto, S. Kubota, First International Symposium on 193 nm Lithography, August 15-18, 1995, Colorado Springs, Col. U. Stamm, W. Zschocke, N. Deutsch, D. Basting, P. Genter, CLEO/Pacific Rim '95, July 10-14, 1995, Chiba, Japan. 3. U. Stamm, W. Zschocke, T. Schroder, Deutsch, D. Basting, Advanced Solid State Lasers, January 27-29, 1997, Orlando, Fla. 2.","PeriodicalId":173652,"journal":{"name":"CLEO '97., Summaries of Papers Presented at the Conference on Lasers and Electro-Optics","volume":"36 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-05-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"100 W cw Al-free 808 nm linear bar arrays\",\"authors\":\"F. Daiminger, S. Heinemann, J. Nappi, M. Toivonen, H. Asonen\",\"doi\":\"10.1109/CLEO.1997.603475\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"limited by thermal effects resulting from UV absorption. We expect an improvement in the 213 nm output power when longer CLBO crystals are used. Corresponding experiments are in preparation. However, fundamental problems in the CLBO crystal fabrication must be solved. Melt grown BBO' with reduced absorption may be a viable alternative. Part of this research was supported by the BMBF contracts 13N 6547/6 and 16 SV 559. 1. L.Y. Liu, W. Wiechmann, M. Oka, Y. Taguchi, H. Wada, Y. Minoya, T. Okamoto, S. Kubota, First International Symposium on 193 nm Lithography, August 15-18, 1995, Colorado Springs, Col. U. Stamm, W. Zschocke, N. Deutsch, D. Basting, P. Genter, CLEO/Pacific Rim '95, July 10-14, 1995, Chiba, Japan. 3. U. Stamm, W. Zschocke, T. Schroder, Deutsch, D. Basting, Advanced Solid State Lasers, January 27-29, 1997, Orlando, Fla. 2.\",\"PeriodicalId\":173652,\"journal\":{\"name\":\"CLEO '97., Summaries of Papers Presented at the Conference on Lasers and Electro-Optics\",\"volume\":\"36 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-05-18\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"CLEO '97., Summaries of Papers Presented at the Conference on Lasers and Electro-Optics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CLEO.1997.603475\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"CLEO '97., Summaries of Papers Presented at the Conference on Lasers and Electro-Optics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CLEO.1997.603475","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
摘要
受紫外线吸收产生的热效应限制。我们期望使用更长的CLBO晶体可以提高213 nm的输出功率。相应的实验正在准备中。然而，CLBO晶体制备的基本问题必须得到解决。减少吸收的熔体生长BBO可能是可行的替代方案。这项研究的一部分由BMBF合同13N 6547/6和16 SV 559支持。1. 2 .刘立英，W. Wiechmann, M. Oka, Y.田口，H. Wada, Y. Minoya, T. Okamoto, S.久保田，第一次193纳米光刻国际研讨会，1995年8月15-18日，科罗拉多斯普林斯，c.u. Stamm, W. Zschocke, N. Deutsch, D. Basting, P. Genter, CLEO/Pacific Rim '95, 1995年7月10-14日，千叶，日本。U. Stamm, W. Zschocke, T. Schroder, Deutsch, D. Basting，先进固体激光器，1997年1月27-29日，奥兰多，佛罗里达州。
limited by thermal effects resulting from UV absorption. We expect an improvement in the 213 nm output power when longer CLBO crystals are used. Corresponding experiments are in preparation. However, fundamental problems in the CLBO crystal fabrication must be solved. Melt grown BBO' with reduced absorption may be a viable alternative. Part of this research was supported by the BMBF contracts 13N 6547/6 and 16 SV 559. 1. L.Y. Liu, W. Wiechmann, M. Oka, Y. Taguchi, H. Wada, Y. Minoya, T. Okamoto, S. Kubota, First International Symposium on 193 nm Lithography, August 15-18, 1995, Colorado Springs, Col. U. Stamm, W. Zschocke, N. Deutsch, D. Basting, P. Genter, CLEO/Pacific Rim '95, July 10-14, 1995, Chiba, Japan. 3. U. Stamm, W. Zschocke, T. Schroder, Deutsch, D. Basting, Advanced Solid State Lasers, January 27-29, 1997, Orlando, Fla. 2.
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