{"title":"失配诱导应力和材料孔隙率影响下两级米勒补偿放大器制造的预测。元素密度的增加","authors":"E. Pankratov","doi":"10.20431/2349-4050.08001003","DOIUrl":null,"url":null,"abstract":"In the present time several actual problems of the solid state electronics (such as increasing of performance, reliability and density of elements of integrated circuits: diodes, field-effect and bipolar transistors) are intensively solving [1-6]. To increase the performance of these devices it is attracted an interest determination of materials with higher values of charge carriers mobility [7-10]. One way to decrease dimensions of elements of integrated circuits is manufacturing them in thin film heterostructures [3-5,11]. In this case it is possible to use inhomogeneity of heterostructure and necessary optimization of doping of electronic materials [12] and development of epitaxial technology to improve these materials (including analysis of mismatch induced stress) [13-15]. An alternative approaches to increase dimensions of integrated circuits are using of laser and microwave types of annealing [1618].","PeriodicalId":286316,"journal":{"name":"International Journal of Innovative Research in Electronics and Communications","volume":"4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"On Prognosis of Manufacturing of A Two Stages Miller Compensated Amplifier under Influence of Missmatch Induced Stress and Porosity of Materials. Increase of Density of Elements\",\"authors\":\"E. Pankratov\",\"doi\":\"10.20431/2349-4050.08001003\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In the present time several actual problems of the solid state electronics (such as increasing of performance, reliability and density of elements of integrated circuits: diodes, field-effect and bipolar transistors) are intensively solving [1-6]. To increase the performance of these devices it is attracted an interest determination of materials with higher values of charge carriers mobility [7-10]. One way to decrease dimensions of elements of integrated circuits is manufacturing them in thin film heterostructures [3-5,11]. In this case it is possible to use inhomogeneity of heterostructure and necessary optimization of doping of electronic materials [12] and development of epitaxial technology to improve these materials (including analysis of mismatch induced stress) [13-15]. An alternative approaches to increase dimensions of integrated circuits are using of laser and microwave types of annealing [1618].\",\"PeriodicalId\":286316,\"journal\":{\"name\":\"International Journal of Innovative Research in Electronics and Communications\",\"volume\":\"4 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Journal of Innovative Research in Electronics and Communications\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.20431/2349-4050.08001003\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Innovative Research in Electronics and Communications","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.20431/2349-4050.08001003","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
On Prognosis of Manufacturing of A Two Stages Miller Compensated Amplifier under Influence of Missmatch Induced Stress and Porosity of Materials. Increase of Density of Elements
In the present time several actual problems of the solid state electronics (such as increasing of performance, reliability and density of elements of integrated circuits: diodes, field-effect and bipolar transistors) are intensively solving [1-6]. To increase the performance of these devices it is attracted an interest determination of materials with higher values of charge carriers mobility [7-10]. One way to decrease dimensions of elements of integrated circuits is manufacturing them in thin film heterostructures [3-5,11]. In this case it is possible to use inhomogeneity of heterostructure and necessary optimization of doping of electronic materials [12] and development of epitaxial technology to improve these materials (including analysis of mismatch induced stress) [13-15]. An alternative approaches to increase dimensions of integrated circuits are using of laser and microwave types of annealing [1618].