{"title":"全音域低应力镍膜双片硅麦克风的测量结果","authors":"S. Junge, F. Jakobs, W. Lang","doi":"10.1109/MEMSYS.2009.4805498","DOIUrl":null,"url":null,"abstract":"This paper provides an overview of the development, fabrication and measurement results of a new type of silicon microphone. It mainly consists of a low stress nickel membrane with a nonlinear frequency response and a gold backplate electrode. The microphone can be used as condenser or electret microphone. A sensitivity of -64dBV/Pa at 52V bias was obtained with an air gap of 20¿m and membrane resonance at 20kHz.","PeriodicalId":187850,"journal":{"name":"2009 IEEE 22nd International Conference on Micro Electro Mechanical Systems","volume":"551 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-03-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Measurement Results of the First Two Chip Silicon Microphone with Low Stress Nickel Membrane Covering Full Audio Range\",\"authors\":\"S. Junge, F. Jakobs, W. Lang\",\"doi\":\"10.1109/MEMSYS.2009.4805498\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper provides an overview of the development, fabrication and measurement results of a new type of silicon microphone. It mainly consists of a low stress nickel membrane with a nonlinear frequency response and a gold backplate electrode. The microphone can be used as condenser or electret microphone. A sensitivity of -64dBV/Pa at 52V bias was obtained with an air gap of 20¿m and membrane resonance at 20kHz.\",\"PeriodicalId\":187850,\"journal\":{\"name\":\"2009 IEEE 22nd International Conference on Micro Electro Mechanical Systems\",\"volume\":\"551 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2009-03-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2009 IEEE 22nd International Conference on Micro Electro Mechanical Systems\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/MEMSYS.2009.4805498\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 IEEE 22nd International Conference on Micro Electro Mechanical Systems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MEMSYS.2009.4805498","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Measurement Results of the First Two Chip Silicon Microphone with Low Stress Nickel Membrane Covering Full Audio Range
This paper provides an overview of the development, fabrication and measurement results of a new type of silicon microphone. It mainly consists of a low stress nickel membrane with a nonlinear frequency response and a gold backplate electrode. The microphone can be used as condenser or electret microphone. A sensitivity of -64dBV/Pa at 52V bias was obtained with an air gap of 20¿m and membrane resonance at 20kHz.
求助内容：
应助结果提醒方式：
京公网安备 11010802042870号
