{"title":"用数值方法提取堆叠DRAM单元中的电容","authors":"Sukin Yoon, O. Kwon, S. Yoon, T. Won","doi":"10.1109/SISPAD.2000.871216","DOIUrl":null,"url":null,"abstract":"This paper reports a methodology and its application for extracting the capacitance of a stacked DRAM cell structure by a numerical technique. To calculate the cell and parasitic capacitance in a stacked DRAM cell, we employed the finite element method (FEM), and to generate a complicated three-dimensional mesh structure, we used a graphic user interface, a topography simulator and three dimensional grid generator. A concave cylindrical DRAM cell capacitor with a minimum feature size of 0.25 /spl mu/m was chosen as a test vehicle to check the validity of the simulation. In this work, 62 parasitic capacitance values with 4 cell capacitance values were extracted from a stacked DRAM cell structure.","PeriodicalId":132609,"journal":{"name":"2000 International Conference on Simulation Semiconductor Processes and Devices (Cat. No.00TH8502)","volume":"45 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-09-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"An extracting capacitance in a stacked DRAM cell by numerical method\",\"authors\":\"Sukin Yoon, O. Kwon, S. Yoon, T. Won\",\"doi\":\"10.1109/SISPAD.2000.871216\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper reports a methodology and its application for extracting the capacitance of a stacked DRAM cell structure by a numerical technique. To calculate the cell and parasitic capacitance in a stacked DRAM cell, we employed the finite element method (FEM), and to generate a complicated three-dimensional mesh structure, we used a graphic user interface, a topography simulator and three dimensional grid generator. A concave cylindrical DRAM cell capacitor with a minimum feature size of 0.25 /spl mu/m was chosen as a test vehicle to check the validity of the simulation. In this work, 62 parasitic capacitance values with 4 cell capacitance values were extracted from a stacked DRAM cell structure.\",\"PeriodicalId\":132609,\"journal\":{\"name\":\"2000 International Conference on Simulation Semiconductor Processes and Devices (Cat. No.00TH8502)\",\"volume\":\"45 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-09-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2000 International Conference on Simulation Semiconductor Processes and Devices (Cat. No.00TH8502)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SISPAD.2000.871216\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2000 International Conference on Simulation Semiconductor Processes and Devices (Cat. No.00TH8502)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SISPAD.2000.871216","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
An extracting capacitance in a stacked DRAM cell by numerical method
This paper reports a methodology and its application for extracting the capacitance of a stacked DRAM cell structure by a numerical technique. To calculate the cell and parasitic capacitance in a stacked DRAM cell, we employed the finite element method (FEM), and to generate a complicated three-dimensional mesh structure, we used a graphic user interface, a topography simulator and three dimensional grid generator. A concave cylindrical DRAM cell capacitor with a minimum feature size of 0.25 /spl mu/m was chosen as a test vehicle to check the validity of the simulation. In this work, 62 parasitic capacitance values with 4 cell capacitance values were extracted from a stacked DRAM cell structure.