太赫兹带宽在p HBT技术和异质集成与硅CMOS

M. Urteaga, A. Carter, Z. Griffith, R. Pierson, J. Bergman, A. Arias, P. Rowell, J. Hacker, B. Brar, M. Rodwell
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引用次数: 17

摘要

通过积极的光刻和外延缩放,基于inp的异质结双极晶体管的带宽已经扩展到太赫兹频率。在130nm发射极尺寸下,已经演示了最大振荡频率(fmax) >1THz的晶体管,并在670GHz下进行了相应的电路演示。在250nm发射极尺寸下,制备了覆盖e频段(71GHz)至g频段(235GHz)的高效率、高功率密度毫米波功率放大器。通过与Si CMOS的异质集成,可以进一步增强这些高性能晶体管的实用性。我们已经演示了使用嵌入Cu互连的低温氧化物键合工艺实现InP和Si的晶圆级3D集成。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
THz bandwidth InP HBT technologies and heterogeneous integration with Si CMOS
Through aggressive lithographical and epitaxial scaling, the bandwidths of InP-based heterojunction bipolar transistors have been extended to THz frequencies. At 130nm emitter dimensions, transistors with maximum frequencies of oscillation (fmax) of >1THz have been demonstrated with accompanying circuit demonstrations at 670GHz. At 250nm emitter dimensions, high efficiency and high power density mm-wave power amplifiers covering E-band (71GHz) to G-band (235GHz) have been fabricated. The utility of these high performance transistors can be further enhanced through heterogeneous integration with Si CMOS. We have demonstrated wafer-scale 3D integration of InP and Si using a low temperature oxide-to-oxide bonding process with embedded Cu interconnects.
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