低温测温用NTD锗传感器的研制

S. Mathimalar, V. Singh, N. Dokania, V. Nanal, R. G. Pillay, S. Pal, S. Ramakrishnan, A. Shrivastava, P. Maheshwari, P. K. Pujari, S. Oiha, D. Kaniilal, K. C. Jagadeesan, S. V. Thakare
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引用次数: 5

摘要

报道了用于124Sn中寻找无中微子双β衰变(Ovββ)的低温热测量探测器的NTD Ge传感器的研制。由器件级锗晶圆制成的样品在孟买Bhabha原子研究中心(BARC)的Dhruva反应堆中用热中子照射。在77K下,用霍尔效应测量方法估计了辐照锗样品中的载流子浓度。利用正电子湮灭寿命谱和通道技术研究了快中子诱导缺陷。结果表明,在600℃下真空退火2小时是修复缺陷的必要条件。传感器使用Au-Ge欧姆接触由退火的NTD样品制成。初步测量结果表明,在100 mK时,dR/dT显著增大至2.3 kΩ/mK。本文给出了这些测量的细节。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Development of NTD Ge sensors for low temperature thermometry
The development of NTD Ge sensors for use in cryogenic bolometric detector to search for neutrinoless double beta decay (Ovββ) in 124Sn is reported. The samples made from device grade Ge wafers are irradiated with thermal neutrons at Dhruva reactor, Bhabha Atomic Research Centre (BARC), Mumbai. The carrier concentration in irradiated Ge samples is estimated by Hall effect measurement at 77K. The fast neutron induced defects are studied using Positron Annihilation Lifetime Spectroscopy and Channeling. It is found that vacuum annealing of the samples at 600°C for 2 hours is necessary to cure the defects. Sensors are made from annealed NTD samples using Au-Ge Ohmic contact. Preliminary measurements have shown a significantly large dR/dT ~ 2.3 kΩ/mK at 100 mK. Details of these measurements are presented.
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