SF6中脉冲击穿的发散场,初级电子的产生和形成时间滞后

W. Pfeiffer, J. Wolf, P. Zipfl
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引用次数: 2

摘要

这一贡献涉及SF6和SF6- n2混合物在亚微秒范围内的形成时间滞后。研究了不同的电极排列和间隙距离。此外,用紫外线辐射和放射源进行了研究,以评估预电离类型对初级电子产生的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impulse breakdown in SF6 for divergent fields, generation of primary electrons and formative time lags
This contribution deals with formative time lags in SF6 and SF6-N2 mixtures in the submicrosecond range. The investigations were performed for different electrode arrangements and gap distances. Furthermore investigations with UV radiation and with a radioactive source were performed in order to evaluate the influence of the kind of preionization upon the generation of primary electrons.
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