ReRAM电阻波动的研究:物理来源、时间依赖性和记忆可靠性的影响

L. Reganaz, D. Deleruyelle, Q. Rafhay, Joel Minguet Lopez, N. Castellani, J. Nodin, A. Bricalli, G. Piccolboni, G. Molas, F. Andrieu
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引用次数: 1

摘要

我们研究了16kb存储器阵列中ReRAM电阻波动的影响。ReRAM保留和读取电流波动是限制阵列可靠性的主要因素。介绍了一种基于kmc的三维仿真框架,用于对所观察到的机构进行完整的物理描述。在单个细胞松弛(室温下长达一秒)和电阻分布稳定后,单个细胞水平的波动仍然发生,特别是在HRS中。氧空位迁移和复合、RTN和1/f噪声分量对动态演化有贡献。在第一阶段,由于RTN和Vo低能量迁移(在25°C下1-10min),测量到更高更快的电流波动。在第二阶段,Vo迁移的贡献趋于减少,因为它们在团簇中中和或扩散(在25°C下bbb10min)。最后,分析了单个单元波动对存储阵列可变性和可靠性的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigation of resistance fluctuations in ReRAM: physical origin, temporal dependence and impact on memory reliability
We investigate the impact of ReRAM resistance fluctuations in a 16kb memory array. ReRAM retention and read current fluctuations are the main factors limiting the reliability of the array. A KMC-based 3D simulation framework is introduced for a complete physical description of the observed mechanisms. After individual cell relaxation (up to one second at room temperature) and resistance distribution stabilization, single cell level fluctuations still occur, especially in HRS. Oxygen vacancy migration and recombination, RTN and 1/f noise components contribute to the dynamic evolution. In a first phase, higher and faster current fluctuations are measured due to RTN and Vo low energy migration (1-10min at 25°C). In a second phase, the contribution of Vo migration tends to decrease as they neutralize in clusters or diffuse (> 10min at 25°C). Finally, the impact of individual cell fluctuations on the variability and reliability of memory array is analyzed.
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