使用石英晶体微天平提供实时过程监控

H. Tsuchiyama, Steven Lakeman
{"title":"使用石英晶体微天平提供实时过程监控","authors":"H. Tsuchiyama, Steven Lakeman","doi":"10.1109/ISSM51728.2020.9377515","DOIUrl":null,"url":null,"abstract":"The novel sensor for Real-time in situ process monitoring using Quart Crystal Microbalance has been developed to wafer process and deployed in Wafer process. In this document, the deployment result is reviewed and the possibility for the future use is discussed.","PeriodicalId":270309,"journal":{"name":"2020 International Symposium on Semiconductor Manufacturing (ISSM)","volume":"38 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-12-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Using Quartz Crystal Microbalance to Provide Real-Time Process Monitoring\",\"authors\":\"H. Tsuchiyama, Steven Lakeman\",\"doi\":\"10.1109/ISSM51728.2020.9377515\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The novel sensor for Real-time in situ process monitoring using Quart Crystal Microbalance has been developed to wafer process and deployed in Wafer process. In this document, the deployment result is reviewed and the possibility for the future use is discussed.\",\"PeriodicalId\":270309,\"journal\":{\"name\":\"2020 International Symposium on Semiconductor Manufacturing (ISSM)\",\"volume\":\"38 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-12-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 International Symposium on Semiconductor Manufacturing (ISSM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSM51728.2020.9377515\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 International Symposium on Semiconductor Manufacturing (ISSM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM51728.2020.9377515","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

利用石英晶体微天平开发了一种用于硅片工艺现场实时监控的新型传感器,并应用于硅片工艺中。在本文档中,对部署结果进行了审查,并讨论了将来使用的可能性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Using Quartz Crystal Microbalance to Provide Real-Time Process Monitoring
The novel sensor for Real-time in situ process monitoring using Quart Crystal Microbalance has been developed to wafer process and deployed in Wafer process. In this document, the deployment result is reviewed and the possibility for the future use is discussed.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信